A Unified Quasi-3D Subthreshold Behavior Model for Multiple-Gate MOSFETs

被引:5
|
作者
Liou, Juin J. [1 ]
Gao, Hong-Wun [2 ]
Wang, Yeong-Her [2 ]
Chiang, Te-Kuang [3 ]
机构
[1] North Minzu Univ, Sch Elect & Informat Engn, Yinchuan 750021, Peoples R China
[2] Natl Cheng Kung Univ, Inst Microelect, Tainan 701, Taiwan
[3] Natl Univ Kaohsiung, Dept Elect Engn, Adv Devices Simulat Lab, Kaohsiung 811, Taiwan
关键词
Quasi-3D potential approach; quadruple-gate MOSFET; effective scaling length; effective channel width; effective channel height; subthreshold resistance; short-channel effects; subthreshold behavior; multiple-gate MOSFET; JUNCTIONLESS MOSFETS; SCALING THEORY; CIRCUITS; SILICON; VOLTAGE; FIELD;
D O I
10.1109/TNANO.2018.2831718
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Based on the quasi-3D potential approach, a unified subthreshold-potential, threshold-voltage, and subthresholdcurrent model is developed for multiple-gate MOSFETs including a quadruple-gate, triple-gate, and omega-gate MOSFET. Thiswork indicates that the scaling-length-oriented subthreshold current rollup Delta I-sub and threshold voltage roll-off Delta V-th provide the physical insight into well-controlled short-channel effects (SCEs) in terms of effective scaling length lambda(eff) according to the scaling factor. Besides the decreased minimum conducting channel potential Phi(C, min), the smaller scaling-length-induced effective channel width/height (W-eff /H-eff) reflects the smaller effective conducting cross-sectional area, which reduces the subthreshold current degradation due to the increased subthreshold resistance R-sub. By accounting for the coupling factor in the quasi-3D potential approach, W-eff, H-eff, and Phi(C, min) will be increased to some extent to decrease R-sub, which, hence, degrades the subthreshold behavior more extensively in response to SCEs.
引用
收藏
页码:763 / 771
页数:9
相关论文
共 50 条
  • [11] 3D quantum modeling and simulation of multiple-gate nanowire MOSFETs
    Bescond, M
    Nehari, K
    Autran, JL
    Cavassilas, N
    Munteanu, D
    Lannoo, M
    IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, : 617 - 620
  • [12] Compact Modeling of Multiple-Gate MOSFETs
    Taur, Yuan
    Song, Jooyoung
    Yu, Bo
    2008 9TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1-4, 2008, : 258 - 261
  • [13] Compact Modeling of Multiple-Gate MOSFETs
    Taur, Yuan
    Song, Jooyoung
    Yu, Bo
    PROCEEDINGS OF THE IEEE 2008 CUSTOM INTEGRATED CIRCUITS CONFERENCE, 2008, : 257 - 264
  • [14] A Quasi-3D Threshold Voltage Model for Dual-Metal Quadruple-Gate MOSFETs
    Samoju, Visweswara Rao
    Jit, Satyabrata
    Tiwari, Pramod Kumar
    CHINESE PHYSICS LETTERS, 2014, 31 (12)
  • [15] Corner effect in multiple-gate SOI MOSFETs
    Xiong, W
    Park, JW
    Colinge, JP
    2003 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, 2003, : 111 - 113
  • [16] A Review on Compact Modeling of Multiple-Gate MOSFETs
    Song, Jooyoung
    Yu, Bo
    Yuan, Yu
    Taur, Yuan
    IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, 2009, 56 (08) : 1858 - 1869
  • [17] 3D analytical modelling of subthreshold characteristics in vertical Multiple-gate FinFET transistors
    Ritzenthaler, Romain
    Lime, Francois
    Faynot, Olivier
    Cristoloveanu, Sorin
    Iniguez, Benjamin
    SOLID-STATE ELECTRONICS, 2011, 65-66 : 94 - 102
  • [18] Compact RF Modeling of multiple-gate MOSFETs
    Iniguez, B.
    Lazaro, A.
    Moldovan, O.
    2006 EUROPEAN MICROWAVE INTEGRATED CIRCUITS CONFERENCE, 2006, : 213 - +
  • [19] A QUASI-3D ANALYTICAL THRESHOLD VOLTAGE MODEL OF SMALL GEOMETRY MOSFETS
    LAHIRI, SK
    DASGUPTA, A
    MANNA, I
    DAS, MK
    SOLID-STATE ELECTRONICS, 1992, 35 (12) : 1721 - 1727
  • [20] Quantum-mechanical effects in multiple-gate MOSFETs
    Godoy, A.
    Ruiz-Gallardo, A.
    Sampedro, C.
    Gamiz, F.
    JOURNAL OF COMPUTATIONAL ELECTRONICS, 2007, 6 (1-3) : 145 - 148