N-type in-situ doping effect on vapour-liquid-solid silicon nanowire properties for gas sensing applications

被引:9
|
作者
Pichon, L. [1 ]
Rogel, R. [1 ]
Jacques, E. [1 ]
Salaun, A. C. [1 ]
机构
[1] Inst Elect & Telecommun Rennes, Dept Microelect & Microcapteurs, F-35042 Rennes, France
关键词
VLS silicon nanowires; N-type in-situ doping; resistors; ammonia detection; RESISTORS; DNA;
D O I
10.1002/pssc.201300206
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
N-type in-situ doped SiNWs based resistors are fabricated and used as gas (ammonia) sensors. SiNWs are prepared by vapour-liquid-solid method (VLS) using gold as catalyst. In-situ doping level is adjusted by varying the phosphine to silane mole ratio. Because SiNWs can act as sensitive units specific design is developed to allow large sensing areas, following a process fabrication compatible with a mass production planar layout. SiNWs doping effect on ammonia detection is carried out under controlled ammonia/nitrogen mixture varying from 2 ppm to 700 ppm. Results highlight that the relative response, S-g=(I-0-I-g)/I-0, where I-0 and Ig are the current values in vacuum and reactive ambient respectively, follows a linear behaviour. The relative sensitivity, (S=Delta S-g/Delta[NH3]) decreases, whereas the sensitivity (SxI(0)) increases with the increase of the VLS SiNWs doping level. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:344 / 348
页数:5
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