Laser-induced liquid-phase jet-chemical etching of metals

被引:24
|
作者
Stephen, A [1 ]
Sepold, G [1 ]
Metev, S [1 ]
Vollertsen, F [1 ]
机构
[1] BIAS, D-28359 Bremen, Germany
关键词
jet-chemical etching; shape memory alloys; micro-grippers;
D O I
10.1016/j.jmatprotec.2003.10.052
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this treatment method laser radiation, which is guided from a co-axially expanding liquid jet-stream, locally initiates on a metal surface a thermochemical etching reaction, which leads to selective material removal. Time-resolved measurements of the electrical potential were correlated with the specific processing parameters to identify conditions for stable and enhanced chemical etching reactions. The chemical etching reaction was additionally influenced by an electrical field. Depending on its polarity a significant increase in the etch rate or improvement of the treatment quality was observed. Exemplary, the fabrication of superelastic micro-grippers prepared by cutting of temperature-sensitive shape memory alloys is shown. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:536 / 540
页数:5
相关论文
共 50 条
  • [21] PULSE LASER-INDUCED IGNITION OF EXPLOSIVE LIQUID-PHASE CRYSTALLIZATION OF AMORPHOUS-SILICON
    WAGNER, M
    ANDRA, G
    GLASER, E
    GOTZ, G
    BARTSCH, H
    EPM 87: ENERGY PULSE AND PARTICLE BEAM MODIFICATION OF MATERIALS, 1988, 8 : 457 - 459
  • [22] Investigation of laser-induced breakdown spectroscopy of a liquid jet
    Feng, Yuan
    Yang, Jiajun
    Fan, Jianmei
    Yao, Guanxin
    Ji, Xuehan
    Zhang, Xianyi
    Zheng, Xianfeng
    Cui, Zhifeng
    APPLIED OPTICS, 2010, 49 (13) : C70 - C74
  • [23] LASER-INDUCED CHEMICAL ETCHING OF COMPOSITE STRUCTURE OF FERRITE AND SENDUST
    NAGATOMO, S
    TAKAI, M
    LU, YF
    NAMBA, S
    LASER- AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES, 1989, 129 : 333 - 337
  • [24] ESTIMATION OF THE CAPABILITIES OF MASKLESS MICROPATTERNING BY LASER-INDUCED CHEMICAL ETCHING
    SYTOV, IP
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1995, 61 (01): : 75 - 80
  • [25] LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE.
    Mogyorosi, P.
    Kullmer, R.
    Bauerle, D.
    Applied physics. A, Solids and surfaces, 1988, A45 (04): : 293 - 299
  • [26] MODEL OF LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE
    SYTOV, IP
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 55 (04): : 372 - 377
  • [27] On chemical reactions in the laser-induced breakdown of a liquid
    Margulis, M. A.
    Ovchinnikov, O. B.
    Margulis, I. M.
    RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY, 2006, 80 (06): : 986 - 990
  • [28] On chemical reactions in the laser-induced breakdown of a liquid
    M. A. Margulis
    O. B. Ovchinnikov
    I. M. Margulis
    Russian Journal of Physical Chemistry, 2006, 80 : 986 - 990
  • [29] Optimization of the solution composition for laser-induced chemical liquid phase deposition of copper
    V. A. Kochemirovsky
    S. V. Safonov
    I. I. Tumkin
    Yu. S. Tver’yanovich
    I. A. Balova
    L. G. Menchikov
    Russian Chemical Bulletin, 2011, 60 : 1564 - 1570
  • [30] Optimization of the solution composition for laser-induced chemical liquid phase deposition of copper
    Kochemirovsky, V. A.
    Safonov, S. V.
    Tumkin, I. I.
    Tver'yanovich, Yu S.
    Balova, I. A.
    Menchikov, L. G.
    RUSSIAN CHEMICAL BULLETIN, 2011, 60 (08) : 1564 - 1570