Electronic structure of amorphous GexSe1-x thin films around the stiffness threshold composition

被引:0
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作者
Hosokawa, S [1 ]
机构
[1] Univ Marburg, Inst Phys Kern & Makromol Chem, D-35032 Marburg, Germany
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中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Valence- and conduction-band densities of states of GexSe1-x thin films (0 less than or equal to x less than or equal to 0.333) were investigated by measuring ultraviolet photoemission and inverse-photoemission spectra. They exhibit remarkable changes in their spectral features near x = 0.20 from amorphous Se-like to amorphous GeSe2-like. These observations in the electronic structures are consistent with the occurrence of a percolation threshold in non-crystalline covalent network systems as predicted by Phillips and Thorpe.
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页码:439 / 442
页数:4
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