共 50 条
- [32] Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (04):
- [33] The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3): : 317 - 322
- [35] Structure and adhesion of ZrN films formed by reactive magnetron sputtering ion plating and dynamic ion mixing 1600, American Inst of Physics, Woodbury, NY, USA (74):
- [37] Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 348 - 354
- [38] Microhardness characterization of superlattices formed by reactive magnetron sputtering and ion beam assisted deposition SURFACE & COATINGS TECHNOLOGY, 2002, 158 : 685 - 689
- [39] The influence of the target age on laterally resolved ion distributions in reactive planar magnetron sputtering SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S294 - S298
- [40] Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation SURFACE & COATINGS TECHNOLOGY, 2004, 183 (2-3): : 184 - 189