Negative Ion Density Measurements in Reactive Magnetron Sputtering

被引:5
|
作者
Dodd, Robert [1 ]
You, ShaoDong [1 ]
Bryant, Paul M. [1 ]
Bradley, James W. [1 ]
机构
[1] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
基金
英国工程与自然科学研究理事会;
关键词
deposition; laser ablation; magnetron; PROBE SURFACE ABLATION; DISCHARGE; OXYGEN;
D O I
10.1002/ppap.200931606
中图分类号
O59 [应用物理学];
学科分类号
摘要
A combination of laser photo-detachment and conventional Langmuir probing has been used to obtain the bulk negative ion density in both a DC and radio frequency (RF) sputter magnetron. The argon and oxygen discharges were operated at low powers and over a range of pressures. The photo-detachment signal is expected to reach a limiting value; however, the signal continues to increase with laser energy density and this can be attributed to a laser ablation effect. In the RF magnetron the electron temperature (T-e) in oxygen decreased with increasing pressure, whereas the electron density (N-e) increased from 0.53 to 8.6 x 10(14)m (3). At around 12 mTorr, a sudden increase in Ne by 3.7 is accompanied by a small drop in T-e. The negative ion density (N_) also increases with pressure reaching a maximum of 1.7 x 10(14) m(3) between 5 and 10 mTorr. Under similar conditions, the DC magnetron negative ion fraction (N_/Ne) is estimated to be similar to 0.01, being significantly lower than in the RF magnetron where N_/Ne approximate to 1.
引用
收藏
页码:S615 / S619
页数:5
相关论文
共 50 条
  • [31] Generation of Positive and Negative Oxygen Ions in Magnetron Discharge During Reactive Sputtering of Alumina
    Pokorny, Petr
    Bulir, Jiri
    Lancok, Jan
    Musil, Jindrich
    Novotny, Michal
    PLASMA PROCESSES AND POLYMERS, 2010, 7 (11) : 910 - 914
  • [32] Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
    Lundin, Daniel
    Cada, Martin
    Hubicka, Zdenek
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (04):
  • [33] The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system
    Kelly, PJ
    Arnell, RD
    SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3): : 317 - 322
  • [34] Ti ion density in inductively coupled plasma enhanced dc magnetron sputtering
    Nakamura, T
    Okimura, K
    VACUUM, 2004, 74 (3-4) : 391 - 395
  • [36] STRUCTURE AND ADHESION OF ZRN FILMS FORMED BY REACTIVE MAGNETRON SPUTTERING ION PLATING AND DYNAMIC ION MIXING
    JIN, S
    WEN, XY
    GONG, ZX
    ZHU, YC
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (04) : 2886 - 2891
  • [37] Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering
    Misina, M
    Shaginyan, LR
    Macek, M
    Panjan, P
    SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 348 - 354
  • [38] Microhardness characterization of superlattices formed by reactive magnetron sputtering and ion beam assisted deposition
    Blando, E
    Hübler, R
    SURFACE & COATINGS TECHNOLOGY, 2002, 158 : 685 - 689
  • [39] The influence of the target age on laterally resolved ion distributions in reactive planar magnetron sputtering
    Welzel, Thomas
    Ellmer, Klaus
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S294 - S298
  • [40] Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation
    Depla, D
    De Gryse, R
    SURFACE & COATINGS TECHNOLOGY, 2004, 183 (2-3): : 184 - 189