Microstructure and thermal stability of Ti1-xAlxN coatings deposited by reactive magnetron co-sputtering

被引：19
|
作者：
Du, Miao [1 ]
Hao, Lei [1 ]
Liu, Xiaopeng [1 ]
Jiang, Lijun [1 ]
Wang, Shumao [1 ]
Lv, Fang [1 ]
Li, Zhinian [1 ]
Mi, Jing [1 ]
机构：
[1] Gen Res Inst Nonferrous Met, Dept Energy Mat & Technol, Beijing 100088, Peoples R China
来源：
PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING | 2011年 / 18卷
关键词：
Ti(1-x)Al(x)N coating; magnetron co-sputtering; microstructure; thermal stability; AL-N COATINGS; TANDEM ABSORBER; FILMS; TIALN;
D O I：
10.1016/j.phpro.2011.06.085
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Ti(1-x)Al(x)N (0.25 <= x <= 0.75) coatings were deposited by reactive DC/RF magnetron co-sputtering. The phase structure, microstructure, surface roughness and chemical composition were investigated. The anti-oxidation behavior of coatings at high temperature was also studied. It has been shown that the coatings with high Al content (x >= 0.67) consisted of hexagonal-AlN and cubic-TiAlN phases, while it has cubic-TiAlN phase for the coatings with low Al content (x<0.67). The roughness of surface of coatings was 1.89 similar to 4.80nm and it decreased with increasing the Al content. The thermal-stability of the Ti(1-x)Al(x)N coatings increased with increasing Al content. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Selection and/or peer-review under responsibility of Lanzhou Institute of Physics, China.
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页数：5
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