Optical properties of PLZT thin films determined using reflection spectra

被引：1
|
作者：
Pencheva, T [1 ]
机构：
[1] Univ Rousse, Dept Phys, Rousse 7017, Bulgaria
来源：
26TH INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY, CONFERENCE PROCEEDINGS: INTEGRATED MANAGEMENT OF ELECTRONIC MATERIALS PRODUCTION | 2003年
关键词：
D O I：
10.1109/ISSE.2003.1260554
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Optical properties of thin PLZT films of various stoichiometry are determined using reflectance spectra processing. The knowledge of optical properties of PLZT thin films is quite necessary for opto-electronic applications. Materials like PLZT are attractive for the application in integrated optics and for realisation of various microelectronic and opto-electronic devices. Their optical properties are strongly dependent on deposition conditions and defects concentration. Thin PLZT films are prepared by pulsed laser deposition on sapphire substrates at different oxygen pressure. Film structure is investigated by WDX. Changes of film refractive index n(lambda), extinction k(lambda) with wavelength in the spectral region 0.3 - 1.1 mum and film thickness d are determined as a result of films reflectance spectra modeling and fitting procedure using all points of the spectra.
引用
收藏
页码：371 / 374
页数：4
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