Room-temperature light emission from a highly strained Si/Ge superlattice

被引:42
|
作者
Zakharov, ND
Talalaev, VG
Werner, P
Tonkikh, AA
Cirlin, GE
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle Saale, Germany
[2] RAS, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
[3] RAS, Inst Analyt Instrumentat, St Petersburg 190103, Russia
关键词
D O I
10.1063/1.1618377
中图分类号
O59 [应用物理学];
学科分类号
摘要
We discuss the formation of a Si/Ge-superlattice (SL) generated by molecular beam epitaxy. Specific growth parameter were chosen to optimize the periodic structure of vertically stacked Ge islands. Optimized SLs show a strong photoluminescence at a wavelength in the region of 1.55 mum up to room temperature. The luminescence is explained by a recombination of electrons in a miniband and holes localized in the Ge islands. The morphology and the crystal structure of the SL, which are influenced by the growth parameters, were analyzed by transmission electron microscopy techniques. It is demonstrated that doping of the SL structure by antimony improves both structural and optical properties. (C) 2003 American Institute of Physics.
引用
收藏
页码:3084 / 3086
页数:3
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