Reduction reaction analysis of nanoparticle copper oxide for copper direct bonding using formic acid

被引:18
|
作者
Fujino, Masahisa [1 ]
Akaike, Masatake [1 ]
Matsuoka, Naoya [1 ]
Suga, Tadatomo [1 ]
机构
[1] Univ Tokyo, Dept Precis Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
2 ALTERNATIVE MODES; THERMAL-DECOMPOSITION; ROOM-TEMPERATURE; SURFACE; ACTIVATION; SUPEROXIDE; ADSORPTION; OXIDATION; XPS;
D O I
10.7567/JJAP.56.04CC01
中图分类号
O59 [应用物理学];
学科分类号
摘要
Copper direct bonding is required for electronics devices, especially power devices, and copper direct bonding using formic acid is expected to lower the bonding temperature. In this research, we analyzed the reduction reaction of copper oxide using formic acid with a Pt catalyst by electron spin resonance analysis and thermal gravimetry analysis. It was found that formic acid was decomposed and radicals were generated under 200 degrees C. The amount of radicals generated was increased by adding the Pt catalyst. Because of these radicals, both copper(I) oxide and copper(II) oxide start to be decomposed below 200 degrees C, and the reduction of copper oxide is accelerated by reactants such as H-2 and CO from the decomposition of formic acid above 200 degrees C. The Pt catalyst also accelerates the reaction of copper oxide reduction. Herewith, it is considered that the copper surface can be controlled more precisely by using formic acid to induce direct bonding. (c) 2017 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [41] COPPER TO COPPER DIRECT BONDING ASSISTED BY SELF-ASSEMBLED MONOLAYER
    Lim, D. F.
    Ang, X. F.
    Wei, J.
    Ng, C. M.
    Tan, C. S.
    PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION 2010, VOL 4, 2012, : 85 - +
  • [42] Effect of Copper–Copper Direct Bonding on Voiding in Metal Thin Films
    P. Gondcharton
    B. Imbert
    L. Benaissa
    F. Fournel
    M. Verdier
    Journal of Electronic Materials, 2015, 44 : 4128 - 4133
  • [43] Phosphate tuned copper electrodeposition and promoted formic acid selectivity for carbon dioxide reduction
    Zhao, Jian
    Sun, Libo
    Canepa, Silvia
    Sun, Hongyu
    Yesibolati, Murat Nulati
    Sherburne, Matthew
    Xu, Rong
    Sritharan, Thirumany
    Loo, Joachim S. C.
    Ager, Joel W., III
    Barber, James
    Molhave, Kristian
    Xu, Zhichuan J.
    JOURNAL OF MATERIALS CHEMISTRY A, 2017, 5 (23) : 11905 - 11916
  • [44] The reduction of copper oxide by hydrogen
    Pease, RN
    Taylor, HS
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1921, 43 : 2179 - 2188
  • [45] ON THE REDUCTION OF COPPER-OXIDE
    WANG, HP
    YEH, CT
    JOURNAL OF THE CHINESE CHEMICAL SOCIETY, 1983, 30 (02) : 139 - 143
  • [46] Direct-writing of copper-based micropatterns on polymer substrates using femtosecond laser reduction of copper (II) oxide nanoparticles
    Mizoshiri, Mizue
    Ito, Yasuaki
    Sakurai, Junpei
    Hata, Seiichi
    NANOSENSORS, BIOSENSORS, INFO-TECH SENSORS AND 3D SYSTEMS 2017, 2017, 10167
  • [47] Hydrothermal synthesis of titanium-supported nanoporous palladium-copper electrocatalysts for formic acid oxidation and oxygen reduction reaction
    Yi, Qing-feng
    Xiao, Xing-zhong
    Liu, Yun-qing
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2013, 23 (04) : 1184 - 1190
  • [48] Facile route for preparation of cuprous oxide/copper/cupric oxide nanoparticles by using simultaneous electrochemical and reduction reaction
    Linh, Ha Xuan
    Linh, Pham Hoai
    Tuan, Duong Dinh
    Quynh, Pham Huong
    Hoa, Nguyen Xuan
    Thanh, Dang Van
    Hiep, Hoang Phu
    Dung, Nguyen Quoc
    HELIYON, 2024, 10 (03)
  • [49] Towards Copper-Copper Direct Bonding: Controlled Crystal Growth of Copper Deposits for Minimization of Interface Formation During Bonding
    Schmidt, Ralf
    Schwarz, Christian
    Kirbach, Uwe
    Jaeger, Cornelia
    IEEE 71ST ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC 2021), 2021, : 1922 - 1927
  • [50] Copper and Copper Oxide Nanoparticle Formation by Chemical Vapor Nucleation From Copper (II) Acetylacetonate
    Albert G. Nasibulin
    P. Petri Ahonen
    Olivier Richard
    Esko I. Kauppinen
    Igor S. Altman
    Journal of Nanoparticle Research, 2001, 3 : 383 - 398