Reduction reaction analysis of nanoparticle copper oxide for copper direct bonding using formic acid

被引:18
|
作者
Fujino, Masahisa [1 ]
Akaike, Masatake [1 ]
Matsuoka, Naoya [1 ]
Suga, Tadatomo [1 ]
机构
[1] Univ Tokyo, Dept Precis Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
2 ALTERNATIVE MODES; THERMAL-DECOMPOSITION; ROOM-TEMPERATURE; SURFACE; ACTIVATION; SUPEROXIDE; ADSORPTION; OXIDATION; XPS;
D O I
10.7567/JJAP.56.04CC01
中图分类号
O59 [应用物理学];
学科分类号
摘要
Copper direct bonding is required for electronics devices, especially power devices, and copper direct bonding using formic acid is expected to lower the bonding temperature. In this research, we analyzed the reduction reaction of copper oxide using formic acid with a Pt catalyst by electron spin resonance analysis and thermal gravimetry analysis. It was found that formic acid was decomposed and radicals were generated under 200 degrees C. The amount of radicals generated was increased by adding the Pt catalyst. Because of these radicals, both copper(I) oxide and copper(II) oxide start to be decomposed below 200 degrees C, and the reduction of copper oxide is accelerated by reactants such as H-2 and CO from the decomposition of formic acid above 200 degrees C. The Pt catalyst also accelerates the reaction of copper oxide reduction. Herewith, it is considered that the copper surface can be controlled more precisely by using formic acid to induce direct bonding. (c) 2017 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [21] A Combined Process of Formic Acid Pretreatment for Low-Temperature Bonding of Copper Electrodes
    Yang, Wenhua
    Akaike, Masatake
    Fujino, Masahisa
    Suga, Tadatomo
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2013, 2 (06) : P271 - P274
  • [22] ANALYSIS OF OXIDE FILMS ON COPPER BY COULOMETRIC REDUCTION
    RONNQUIST, A
    ACTA CHEMICA SCANDINAVICA, 1960, 14 (08): : 1855 - 1856
  • [23] Reduction of copper oxide film to elemental copper
    Soininen, PJ
    Elers, KE
    Saanila, V
    Kaipio, S
    Sajavaara, T
    Haukka, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (02) : G122 - G125
  • [24] Direct reduction of copper-iron-silicon oxide melts
    Parra, R
    Wilkomirsky, I
    Allibert, M
    SMELTING, TECHNOLOGY DEVELOPMENT, PROCESS MODELING AND FUNDAMENTALS, 1999, : 553 - 570
  • [25] Copper-Copper Direct Bonding: Impact of Grain Size
    Gondcharton, P.
    Imbert, B.
    Benaissa, L.
    Verdier, M.
    2015 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND 2015 IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE (IITC/MAM), 2015, : 229 - 231
  • [26] Kinetics of low temperature direct copper-copper bonding
    Gondcharton, P.
    Imbert, B.
    Benaissa, L.
    Carron, V.
    Verdier, M.
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2015, 21 (05): : 995 - 1001
  • [27] REACTION OF STEARIC ACID MONOLAYERS WITH COPPER AND CUPROUS OXIDE
    TABOR, D
    NATURE, 1954, 174 (4428) : 507 - 508
  • [28] Highly-active copper oxide/copper electrocatalysts induced from hierarchical copper oxide nanospheres for carbon dioxide reduction reaction
    Qiao, Jinli
    Fan, Mengyang
    Fu, Yishu
    Bai, Zhengyu
    Ma, Chengyu
    Liu, Yuyu
    Zhou, Xiao-Dong
    ELECTROCHIMICA ACTA, 2015, 153 : 559 - 565
  • [29] Morphology of copper corrosion and dissolution rate of copper in formic acid solution
    Sakai, Masahiro
    Kameda, Yusuke
    Yamaguchi, Kentaro
    Zairyo to Kankyo/ Corrosion Engineering, 2013, 62 (03): : 103 - 106
  • [30] Direct Silver to Copper Bonding Process
    Wang, Pin J.
    Kim, Jong S.
    Lee, Chin C.
    JOURNAL OF ELECTRONIC PACKAGING, 2008, 130 (04)