Generation of interstitial boron by minority-carrier injection

被引:0
|
作者
Ohshita, Y [1 ]
Vu, TK [1 ]
Yamaguchi, M [1 ]
机构
[1] Toyota Technol Inst, Tempa Ku, Nagoya, Aichi 4688511, Japan
关键词
light degradation; B-O defect;
D O I
10.1016/S0927-0248(02)00188-5
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The performance of boron-doped CZ Si solar cell is degraded by the light irradiation and/or the minority carrier (electron) injection. To understand these phenomena, ab initio molecular orbital calculations are carried out using a cluster model. The theoretical results indicate that the activation energy for kicking out a substitutional B by the interstitial Si is decreased due to the injected electron. Therefore,the interstitial B is easily produced by the minority carrier injection and then diffuses in the Si crystal, resulting in the generation of the interstitial B and interstitial O defect complex. (C) 2002 Elsevier Science B.V. All rights reserved.
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页码:405 / 409
页数:5
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