Mass transfer of niobium and copper in binary systems obtained by magnetron sputtering

被引：0
|
作者：
Postnikov, D. V. [1 ]
Blesman, A. I. [1 ,2 ]
Polonyankin, D. A. [1 ,2 ]
Ibnoyaminova, S. L. [1 ]
Teplouhov, A. A. [1 ]
机构：
[1] Omsk State Tech Univ OmSTU, Phys Dept, 11 Mira Ave, Omsk 644050, Russia
[2] Omsk State Tech Univ OmSTU, Sci Educ Resource Ctr Nanotechnol, 11 Mira Ave, Omsk 644050, Russia
来源：
25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2018年 / 387卷
关键词：
TEMPERATURE;
D O I：
10.1088/1757-899X/387/1/012060
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
This paper provides the mutual low-temperature mass transfer in binary systems obtained by magnetron sputtering of niobium onto a heated copper substrate. Based on the kinetic equation of diffusion, the distribution of the niobium through the substrate's depth at temperatures of 100, 200 and 300 degrees C is calculated. The method of calculating the concentration profiles of niobium, proposed in the manuscript, was verified using experimental data of energy-dispersive analysis.
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页数：4
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