Mass transfer of niobium and copper in binary systems obtained by magnetron sputtering

被引：0
|
作者：
Postnikov, D. V. [1 ]
Blesman, A. I. [1 ,2 ]
Polonyankin, D. A. [1 ,2 ]
Ibnoyaminova, S. L. [1 ]
Teplouhov, A. A. [1 ]
机构：
[1] Omsk State Tech Univ OmSTU, Phys Dept, 11 Mira Ave, Omsk 644050, Russia
[2] Omsk State Tech Univ OmSTU, Sci Educ Resource Ctr Nanotechnol, 11 Mira Ave, Omsk 644050, Russia
来源：
25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2018年 / 387卷
关键词：
TEMPERATURE;
D O I：
10.1088/1757-899X/387/1/012060
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
This paper provides the mutual low-temperature mass transfer in binary systems obtained by magnetron sputtering of niobium onto a heated copper substrate. Based on the kinetic equation of diffusion, the distribution of the niobium through the substrate's depth at temperatures of 100, 200 and 300 degrees C is calculated. The method of calculating the concentration profiles of niobium, proposed in the manuscript, was verified using experimental data of energy-dispersive analysis.
引用
收藏
页数：4
相关论文
共 50 条
  • [31] Magnetron Sputtering Deposition of Intermetallic Coatings Using Tin and Niobium Plasma
    Yurjev, Yu. N.
    Kharisova, A. E.
    Selezneva, T. V.
    Savelev, A. I.
    Kazimirov, A. I.
    RUSSIAN PHYSICS JOURNAL, 2023, 65 (11) : 2004 - 2009
  • [32] Magnetron Sputtering Deposition of Intermetallic Coatings Using Tin and Niobium Plasma
    Yu. N. Yurjev
    A. E. Kharisova
    T. V. Selezneva
    A. I. Savelev
    A. I. Kazimirov
    Russian Physics Journal, 2023, 65 : 2004 - 2009
  • [33] Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering
    X. Li
    W. H. Cao
    X. F. Tao
    L. L. Ren
    L. Q. Zhou
    G. F. Xu
    Applied Physics A, 2016, 122
  • [34] SUPERCONDUCTING AND STRUCTURE PROPERTIES OF NIOBIUM NITRIDE PREPARED BY RF MAGNETRON SPUTTERING
    CUKAUSKAS, EJ
    CARTER, WL
    QADRI, SB
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (07) : 2538 - 2542
  • [35] Enhanced radio-frequency performance of niobium films on copper substrates deposited by high power impulse magnetron sputtering
    Arzeo, M.
    Avino, F.
    Pfeiffer, S.
    Rosaz, G.
    Taborelli, M.
    Vega-Cid, L.
    Venturini-Delsolaro, W.
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2022, 35 (05):
  • [36] Study of niobium nitride films produced by DC reactive magnetron sputtering
    Hotovy, I
    Buc, D
    Brcka, J
    Srnanek, R
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1997, 161 (01): : 97 - 104
  • [37] Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering
    Li, X.
    Cao, W. H.
    Tao, X. F.
    Ren, L. L.
    Zhou, L. Q.
    Xu, G. F.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2016, 122 (05):
  • [38] Mass spectrometry investigation of magnetron sputtering discharges
    Pokorny, P.
    Musil, J.
    Lancok, J.
    Fitl, P.
    Novotny, M.
    Bulir, J.
    Vlcek, J.
    VACUUM, 2017, 143 : 438 - 443
  • [39] Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering
    Fenker, M.
    Kappl, H.
    Banakh, O.
    Martin, N.
    Pierson, J. F.
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (07): : 4152 - 4157
  • [40] Structural Properties of Thin Films Obtained by Magnetron Sputtering of Polydiacetylene
    O. A. Streletskii
    I. A. Zavidovskii
    O. Yu. Nishchak
    A. N. Shchegolikhin
    N. F. Savchenko
    Physics of the Solid State, 2020, 62 : 2184 - 2190
12345