Mass transfer of niobium and copper in binary systems obtained by magnetron sputtering

被引：0

作者：

Postnikov, D. V. ^{[1
]}

Blesman, A. I. ^{[1
,2
]}

Polonyankin, D. A. ^{[1
,2
]}

Ibnoyaminova, S. L. ^{[1
]}

Teplouhov, A. A. ^{[1
]}

机构：

[1] Omsk State Tech Univ OmSTU, Phys Dept, 11 Mira Ave, Omsk 644050, Russia

[2] Omsk State Tech Univ OmSTU, Sci Educ Resource Ctr Nanotechnol, 11 Mira Ave, Omsk 644050, Russia

来源：

25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY | 2018年 / 387卷

关键词：

TEMPERATURE;

D O I：

10.1088/1757-899X/387/1/012060

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This paper provides the mutual low-temperature mass transfer in binary systems obtained by magnetron sputtering of niobium onto a heated copper substrate. Based on the kinetic equation of diffusion, the distribution of the niobium through the substrate's depth at temperatures of 100, 200 and 300 degrees C is calculated. The method of calculating the concentration profiles of niobium, proposed in the manuscript, was verified using experimental data of energy-dispersive analysis.

引用

页数：4

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