Thin Films;
Sputtering;
Structural;
Magnetic materials;
TIN FILMS;
TEMPERATURE;
DEPOSITION;
SUBSTRATE;
D O I:
10.1016/j.matlet.2015.03.095
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Influence of nitrogen fractions[N-f=N-2/(N-2+Ar-2)] on the structural and magnetic properties of Mn3NiNx thin films prepared on quartz substrates using magnetron sputtering have been studied. The N/Ni ratio increased (N/Ni=0.3-1.1) while the peak (200) shifted to lower angles with increasing N-f. It revealed that there was significant variation in the preferred orientation and Neel temperature (T-N) for the films with increasing N-f. Strong indication for a frozen state is found, determined from the difference between field-cooled and zero-field-cooled magnetizations. The ac susceptibility measurements show a peak position shifting as a function of the driving frequencyf and magnetization value does not saturate in the field range. These findings consistently demonstrate that Mn3NiNx thin films exhibit a spin-glass state at low temperature. (C) 2015 Elsevier B.V. All rights reserved.
机构:
Department of Physics, Bharathidasan University, TiruchirappalliDepartment of Physics, Bharathidasan University, Tiruchirappalli
Karthik K.
Pushpa S.
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h-index: 0
机构:
Department of Physics, Tagore Engineering College, ChennaiDepartment of Physics, Bharathidasan University, Tiruchirappalli
Pushpa S.
Madhukara Naik M.
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h-index: 0
机构:
Department of Studies and Research in Industrial Chemistry, School of Chemical Sciences, Kuvempu University, ShankaragattaDepartment of Physics, Bharathidasan University, Tiruchirappalli
Madhukara Naik M.
Vinuth M.
论文数: 0引用数: 0
h-index: 0
机构:
Department of Chemistry, NIE Institute of Technology, Mysuru, KarnatakaDepartment of Physics, Bharathidasan University, Tiruchirappalli
Vinuth M.
Materials Research Innovations,
2020,
24
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: 82
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86