A new photoresist based on poly(amidoamine) dendrimer

A positive-working photoresist based on the first generation poly(amidoamine) dendrimer 2 having phenol groups on its periphery and diazonaphthoquinone (DNQ) as a photosensitive compound has been developed. Dendrimer 2b was prepared by the Michael addition reaction of N-(2-hydroxy-5-methylphenyl)-2-propenamide 1b with the first generation poly(amidoamine) dendrimer. Obtained 2b has a high transparency to UV-light above 300 nm. The photoresist consisting 2b and DNQ (30 wt%) showed a sensitivity of 65 mJ/cm(2) and a contrast of 3.0, when it was exposed to 365 nm light and developed with a 0.2 wt% aqueous tetramethylammonium hydroxide (TMAH) solution.