A new photoresist based on poly(amidoamine) dendrimer

被引:1
|
作者
Fujigaya, T [1 ]
Ueda, M [1 ]
机构
[1] Tokyo Inst Technol, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
关键词
poly(amidoamine) dendrimer; phenol group; photoresist; dissolution inhibitor; diazonaphthoquinone; positive type;
D O I
10.1295/koron.57.836
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
A positive-working photoresist based on the first generation poly(amidoamine) dendrimer 2 having phenol groups on its periphery and diazonaphthoquinone (DNQ) as a photosensitive compound has been developed. Dendrimer 2b was prepared by the Michael addition reaction of N-(2-hydroxy-5-methylphenyl)-2-propenamide 1b with the first generation poly(amidoamine) dendrimer. Obtained 2b has a high transparency to UV-light above 300 nm. The photoresist consisting 2b and DNQ (30 wt%) showed a sensitivity of 65 mJ/cm(2) and a contrast of 3.0, when it was exposed to 365 nm light and developed with a 0.2 wt% aqueous tetramethylammonium hydroxide (TMAH) solution.
引用
收藏
页码:836 / 841
页数:6
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