A new photoresist based on poly(amidoamine) dendrimer

被引：1
|
作者：
Fujigaya, T [1 ]
Ueda, M [1 ]
机构：
[1] Tokyo Inst Technol, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
来源：
KOBUNSHI RONBUNSHU | 2000年 / 57卷 / 12期
关键词：
poly(amidoamine) dendrimer; phenol group; photoresist; dissolution inhibitor; diazonaphthoquinone; positive type;
D O I：
10.1295/koron.57.836
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
A positive-working photoresist based on the first generation poly(amidoamine) dendrimer 2 having phenol groups on its periphery and diazonaphthoquinone (DNQ) as a photosensitive compound has been developed. Dendrimer 2b was prepared by the Michael addition reaction of N-(2-hydroxy-5-methylphenyl)-2-propenamide 1b with the first generation poly(amidoamine) dendrimer. Obtained 2b has a high transparency to UV-light above 300 nm. The photoresist consisting 2b and DNQ (30 wt%) showed a sensitivity of 65 mJ/cm(2) and a contrast of 3.0, when it was exposed to 365 nm light and developed with a 0.2 wt% aqueous tetramethylammonium hydroxide (TMAH) solution.
引用
收藏
页码：836 / 841
页数：6
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