共 50 条
- [35] Research on Mechanism of Chemical Mechanical Polishing Process for Silicon Nitride Balls with CeO2 Abrasive SURFACE FINISHING TECHNOLOGY AND SURFACE ENGINEERING, 2008, 53-54 : 131 - +
- [40] CeO2 particles for chemical mechanical planarization CHEMICAL-MECHANICAL PLANARIZATION, 2003, 767 : 173 - 183