Development of a new generation of 3D pixel sensors for HL-LHC

被引:29
|
作者
Betta, G. -F. Dalla [1 ,2 ]
Boscardin, M. [2 ,3 ]
Darbo, G. [4 ]
Mendicino, R. [1 ,2 ]
Meschini, M. [5 ]
Messineo, A. [6 ,7 ]
Ronchin, S. [3 ]
Sultan, D. M. S. [1 ,2 ]
Zorzi, N. [2 ,3 ]
机构
[1] Univ Trento, Dipartimento Ingn Ind, I-38123 Trento, Italy
[2] TIFPA INFN, I-38123 Trento, Italy
[3] Fdn Bruno Kessler, I-38123 Trento, Italy
[4] Ist Nazl Fis Nucl, Sez Genova, I-16146 Genoa, Italy
[5] Ist Nazl Fis Nucl, Sez Firenze, I-50019 Sesto Fiorentino, Italy
[6] Univ Pisa, Dipartimento Fis, I-56127 Pisa, Italy
[7] Ist Nazl Fis Nucl, Sez Pisa, I-56127 Pisa, Italy
关键词
3D silicon sensors; Deep Reactive Ion Etching; Fabrication technology;
D O I
10.1016/j.nima.2015.08.032
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This paper covers the main technological and design aspects relevant to the development of a new generation of thin 3D pixel sensors with small pixel size aimed at the High-Luminosity LHC upgrades. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:386 / 387
页数:2
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