Effect of post-sputter polishing on the performance of a disc-shaped Pd/ZrO2/Ni hydrogen membrane

被引：6
|
作者：
Hwang, Kyung-Ran [1 ]
Lee, Sung-Wook [1 ,2 ]
Oh, Duck-Kyu [1 ,2 ]
Lee, Chun-Boo [1 ,2 ]
Park, Jong-Soo [1 ]
机构：
[1] Korea Inst Energy Res, 102 Gajeong Ro, Daejeon 305343, South Korea
[2] Korea Univ, Dept Chem & Biol Engn, 5 Ga, Seoul 136701, South Korea
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2016年 / 685卷
关键词：
Pd/ZrO2/Ni membrane; Hydrogen; Post-sputter polishing; Disc shaped membrane; H-2/N-2; selectivity; THIN PD MEMBRANE; COMPOSITE MEMBRANE; SUBSTRATE; METAL;
D O I：
10.1016/j.jallcom.2016.05.205
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A thin and highly selective Pd/ZrO2/Ni membrane (Pd layer: 3.4-3.7 mu m) was fabricated using repetitive cycles of sputtering and polishing processes without any further thermal treatment. Based on the results of a vacuum leak test through the membrane, the polishing step could effectively eliminate some of the defects formed between Pd columns by filling and surface flattening. The prepared Pd membrane exhibited a high hydrogen permeation flux (31.7 ml/min/cm(2)) and a significantly high H-2/N-2 selectivity at del-P = 1 bar and 400 degrees C. The membrane selectivity remained significantly high (24,157 at del-P = 20 bar) even under a large pressure difference. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码：337 / 343
页数：7
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