InAlAs/InGaAs HBT with superlattice confinement emitter

被引:0
|
作者
Lour, WS [1 ]
Hsieh, JL [1 ]
Lia, CY [1 ]
Wu, MY [1 ]
Huang, GL [1 ]
机构
[1] Natl Taiwan Ocean Univ, Dept Elect Engn, Keelung, Taiwan
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A 20-period InAlAs/InGaAs superlattice layer was used a hole confinement layer of a heterojunction bipolar transistor (HBT). The SL-HBT exhibits a much smaller offset voltage and a similar current gain when compared to a conventional HBT with a bulk-InAlAs confinement layer. The measured offset voltage and de current gain are 75 (300) mV and 26 (21) in average for a large-area SL-HBT (HEBT). Furthermore, the SL-HBT shows an area-independent current gain. Transistors with emitter dimensions of 150x150, 46x46, 20x20, and 10x10 mu m(2) exhibit current gains in the range of 26 +/- 3. Experimental results reveal that lateral scaling of SL-HBT's is still effective, just like abrupt emitter InAlAs/InGaAs HBT's.
引用
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页码:555 / 563
页数:9
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