Deep centers in undoped semi-insulating InP

被引:22
|
作者
Fang, ZQ [1 ]
Look, DC
Uchida, M
Kainosho, K
Oda, O
机构
[1] Wright State Univ, Dept Phys, Dayton, OH 45435 USA
[2] Japan Energy Corp, Mat & Components Lab, Toda, Saitama 335, Japan
关键词
deep centers; semi-insulating (SI) InP; thermally stimulated current (TSC) spectroscopy; wafer annealing;
D O I
10.1007/s11664-998-0152-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Undoped semi-insulating (SI) InP samples, subjected to one-step and multi-step wafer annealing, and lightly and normally Fe-doped SI InP samples without annealing have been characterized by thermally stimulated current (TSC) spectroscopy. A dominant deep center at 0.63 eV is found in all samples and is undoubtedly due to iron. Two prominent TSC traps, T-b (0.44 eV) and T-d (0.33 eV), found in undoped SI InP, are thought to be related to the phosphorus antisite P-In, and traps at low temperatures, like T-e* (0.19 eV), to the phosphrus vacancy V-P.
引用
收藏
页码:L68 / L71
页数:4
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