Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics

被引:29
|
作者
Tsarfati, T. [1 ]
van de Kruijs, R. W. E. [1 ]
Zoethout, E. [1 ]
Louis, E. [1 ]
Bijkerk, F. [1 ,2 ]
机构
[1] FOM Inst Plasma Phys Rijnhuizen, Nieuwegein, Netherlands
[2] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
关键词
Multilayer; Lithography; X-FEL; GIXR; TEM; XPS; STRUCTURAL PHASE-STABILITY; DEPTH-RESOLUTION; ENHANCEMENT; GENERATION; MIRRORS; GROWTH;
D O I
10.1016/j.tsf.2010.04.088
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N-2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7<lambda<7.0 nm. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:7249 / 7252
页数:4
相关论文
共 50 条
  • [1] Cr/B4C multilayer mirrors: Study of interfaces and X-ray reflectance
    Burcklen, C.
    Soufli, R.
    Dennetiere, D.
    Polack, F.
    Capitanio, B.
    Gullikson, E.
    Meltchakov, E.
    Thomasset, M.
    Jerome, A.
    de Rossi, S.
    Delmotte, F.
    JOURNAL OF APPLIED PHYSICS, 2016, 119 (12)
  • [2] Multilayer X-ray mirrors based on La/B4C and La/B9C
    S. S. Andreev
    M. M. Barysheva
    N. I. Chkhalo
    S. A. Gusev
    A. E. Pestov
    V. N. Polkovnikov
    D. N. Rogachev
    N. N. Salashchenko
    Yu. A. Vainer
    S. Yu. Zuev
    Technical Physics, 2010, 55 : 1168 - 1174
  • [3] Multilayer X-ray mirrors based on La/B4C and La/B9C
    Andreev, S. S.
    Barysheva, M. M.
    Chkhalo, N. I.
    Gusev, S. A.
    Pestov, A. E.
    Polkovnikov, V. N.
    Rogachev, D. N.
    Salashchenko, N. N.
    Vainer, Yu. A.
    Zuev, S. Yu.
    TECHNICAL PHYSICS, 2010, 55 (08) : 1168 - 1174
  • [4] W/B4C MULTILAYER X-RAY MIRRORS
    JANKOWSKI, AF
    MAKOWIECKI, DM
    OPTICAL ENGINEERING, 1991, 30 (12) : 2003 - 2009
  • [5] GISAXS-based Optimization of La/B4C Multilayer Mirrors for Soft X-ray FEL
    Jergel, Matej
    Siffalovic, Peter
    Majkova, Eva
    Chitu, Livia
    Luby, Stefan
    Vegso, Karol
    Hendel, Stefan
    Lass, Maike
    Sacher, Marco D.
    Hachmann, Wiebke
    Heinzmann, Ulrich
    Timmann, Andreas
    Roth, S. V.
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2009, 65 : S61 - S61
  • [6] Normal-incidence Mo/B4C soft X-ray multilayer
    Lu, Junxia
    Ma, Yueying
    Zhang, Junping
    Cao, Jianlin
    Guangxue Xuebao/Acta Optica Sinica, 1998, 18 (01): : 109 - 111
  • [7] Structural characteristic of Mo/B4C soft X-ray multilayer mirrors
    Lu, Junxia
    Ma, Yueying
    Pei, Shu
    Chen, Xingdan
    Cao, Jianlin
    Guangzi Xuebao/Acta Photonica Sinica, 2000, 29 (05): : 459 - 461
  • [8] Aperiodic W/B4C multilayer systems for X-ray optics: Quantitative determination of layer thickness by HAADF-STEM and X-ray reflectivity
    Haeussler, D.
    Morawe, Ch.
    Ross, U.
    Oeguet, B.
    Spiecker, E.
    Jaeger, W.
    Hertlein, F.
    Heidorn, U.
    Wiesmann, J.
    SURFACE & COATINGS TECHNOLOGY, 2010, 204 (12-13): : 1929 - 1932
  • [9] Optical performance of W/B4C multilayer mirror in the soft x-ray region
    Pradhan, P. C.
    Majhi, A.
    Nayak, M.
    JOURNAL OF APPLIED PHYSICS, 2018, 123 (09)
  • [10] Damages to B4C/W multilayer mirrors by intense soft x-ray bursts
    LeGuern, F
    Troussel, P
    Andre, JM
    Friart, D
    Jalinaud, T
    leGloahec, MR
    Desenne, D
    Boutin, JY
    Dutrannoy, JL
    Nazet, C
    Davi, P
    Barchewitz, R
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (06): : 2107 - 2110