共 50 条
- [42] On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (01): : 136 - 139
- [43] Chemically amplified photoresist characterization using interdigitated electrodes: An improved method for determining the Dill C parameter ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2, 2004, 5376 : 995 - 1006
- [44] Novel photoacid generators for chemically amplified resists with g-line, i-line and DUV exposure ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII, PTS 1 AND 2, 2001, 4345 : 484 - 493
- [45] Non-ionic photoacid generators for chemically amplified resists: evaluation results on the application-relevant properties ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
- [46] Measuring acid generation efficiency in chemically amplified resists with all three beams JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3356 - 3361
- [47] Post exposure bake kinetics in epoxy novolac chemically amplified resists. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 214 : 321 - PMSE
- [49] Simulation of roughness in chemically amplified resists using percolation theory JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3367 - 3370
- [50] Simulation of roughness in chemically amplified resists using percolation theory J Vac Sci Technol B Microelectron Nanometer Struct, (3367-3370):