A Chemically Amplified Molecular Glass Resist with an Ionic Photoacid Generator and a Single Protection Group

被引：2
|
作者：
Kasai, Tatsuaki [1 ]
Higashihara, Tomoya [1 ]
Ueda, Mitsuru [1 ]
机构：
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
来源：
JOURNAL OF APPLIED POLYMER SCIENCE | 2014年 / 131卷 / 02期
关键词：
photochemistry; irradiation; properties and characterization;
D O I：
10.1002/app.39769
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
A molecular glass resist with an ionic photoacid generator and a single protection group (MR-1) has been developed. MR-1 exhibited good thermal properties, such as a 5% weight loss temperature (T-d5%) of 167 degrees C and a glass transition temperature (T-g) of 80 degrees C. MR-1 showed the good sensitivity of 80 mu C/cm(2) and high contrast of 4.9 with e-beam exposure (50 keV). A relatively high resolution of 50 nm and low Line-Edge-Roughness of 3.8 nm were obtained by e-beam exposure (100 keV). (C) 2013 Wiley Periodicals, Inc.
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页数：6
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