Radiation resistance of thin TiN films as a result of irradiation with low-energy Kr14+ ions

The paper presents the results of changes in the structural and strength parameters of TiN-based thin films obtained by magnetron sputtering when irradiated with low-energy Kr14+ ions with an energy of 280 keV. As a result of studying the effect of irradiation on surface morphology, it was found that an increase in the irradiation fluence above 10(13) ion/cm(2) leads to the formation of large sphere-like inclusions in the structure of the surface layer, the average size of which varies from 300 to 700 nm, and the height is 50-70 nm. It was established that a change in the parameters of the crystal lattice and their c/a ratio indicates a change in interplanar spacings due to migration of defects in the structure and their agglomeration, as well as to stretching of the lattice along the c axis and a change in its volume. Based on the change in the intensities and shape of the diffraction maxima, an assumption was made about the reorientation of the texture and the change in the positions of crystallites as a result of their fragmentation or reorientation.