Kinetic Monte Carlo simulation of Ta deposition on Ta (100) surface

A simulation tool based on the kinetic Monte Carlo method was developed to model the surface roughness of Ta deposition on Ta(100) surface. As such, the diffusion barriers were determined using the embedded atom potential. Surface roughness simulation results indicated that high substrate temperature and small deposition rates produce smoother films. Thus, the presented simulation codes can be used to obtain optimal operating conditions that satisfy surface roughness requirements.