Kinetic Monte Carlo simulation of Ta deposition on Ta (100) surface

被引:2
|
作者
Kim, GS
Klug, D
Tse, J
Wu, P
机构
[1] Natl Res Council Canada, Steacie Inst Mol Sci, Ottawa, ON K1A 0R6, Canada
[2] Inst High Performance Comp, Singapore, Singapore
关键词
D O I
10.1023/B:JMSC.0000013933.25764.06
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A simulation tool based on the kinetic Monte Carlo method was developed to model the surface roughness of Ta deposition on Ta(100) surface. As such, the diffusion barriers were determined using the embedded atom potential. Surface roughness simulation results indicated that high substrate temperature and small deposition rates produce smoother films. Thus, the presented simulation codes can be used to obtain optimal operating conditions that satisfy surface roughness requirements.
引用
收藏
页码:1519 / 1522
页数:4
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