Polyimide coatings texture development by ECR-plasma etching

被引：1
|
作者：
Babaevsky, PG [1 ]
Zhukov, AA [1 ]
Zhukova, SA [1 ]
Tchetverov, YS [1 ]
Shapoval, SY [1 ]
机构：
[1] CNII Cyclon, Moscow, Russia
来源：
SIXTH SEMINAR ON PROBLEMS OF THEORETICAL AND APPLIED ELECTRON AND ION OPTICS | 2004年 / 5398卷
关键词：
polyimides; coatings; etching; ECR plasma; texture; profile angle; microelectronics devices;
D O I：
10.1117/12.552179
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Effect of chemical composition and imidization temperature of thin polyimide coatings on etching rate in oxygen) and time of the plasma generated by electron cyclotron resonance source at different bias voltage potential (ion energy process was studied. A correlation of plasmochemical etching rate and topology pattern profile of the polyimide coatings at different etching conditions was determined.
引用
收藏
页码：166 / 170
页数：5
相关论文
共 50 条
  • [21] ECR PLASMA-ETCHING WITH HEAVY HALOGEN IONS
    FUJIWARA, N
    SAWAI, H
    YONEDA, M
    NISHIOKA, K
    ABE, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (10): : 2223 - 2228
  • [22] TRI-LEVEL RESIST ETCHING IN ECR PLASMA
    MIHARA, S
    ABE, N
    TAKASAKI, K
    KAWASHIMA, K
    DENKI KAGAKU, 1989, 57 (05): : 426 - 429
  • [23] PULSED OPERATION OF A MPDR-TYPE ECR-PLASMA SOURCE FOR HIGH-POWER APPLICATIONS
    PAPENBREER, RL
    ENGEMANN, J
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (04): : 2550 - 2552
  • [24] ECR-PLASMA ASSISTED LASER ABLATION OF AS-DEPOSITED SUPERCONDUCTING THIN-FILMS FOR APPLICATION IN MICROELECTRONICS
    DENEFFE, K
    VANMIEGHEM, P
    BRIJS, B
    VANDERVORST, W
    MERTENS, R
    BORGHS, G
    JOURNAL OF THE LESS-COMMON METALS, 1990, 164 : 307 - 314
  • [25] Low temperature ECR-plasma assisted MOCVD microcrystalline and amorphous GaN deposition and characterization for electronic devices
    Hassan, Z.
    Kordesch, M.E.
    Jadwisffinzak, W.M.
    Lozykowski, H.J.
    Halverson, W.
    Colter, P.C.
    Materials Research Society Symposium - Proceedings, 1999, 536 : 245 - 250
  • [26] Experimental study on dynamic effects of H- and D- negative ions in an ECR-plasma source
    Mitrou, M.
    Svarnas, P.
    Bechu, S.
    19TH INTERNATIONAL CONFERENCE ON ION SOURCES - ICIS2021, 2022, 2244
  • [27] The effect of plasma chemical etching on the properties of thin polyimide coatings differing by the chemical composition and molecular weight
    Zhukov, AA
    Zhukova, SA
    Korneeva, GA
    Tchetverov, YS
    SIXTH SEMINAR ON PROBLEMS OF THEORETICAL AND APPLIED ELECTRON AND ION OPTICS, 2004, 5398 : 171 - 178
  • [28] Residue-free plasma etching of polyimide coatings for small pitch vias with improved step coverage
    Mimoun, Benjamin
    Pham, Hoa T. M.
    Henneken, Vincent
    Dekker, Ronald
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (02):
  • [29] Realization of MW ECR-plasma sources and technological processes for field emitter arrays of large flat displays
    Gulyaev, YV
    Yafarov, RK
    IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 1996, : 446 - 448
  • [30] Low temperature ECR-plasma assisted MOCVD microcrystalline and amorphous GaN deposition and characterization for electronic devices
    Hassan, Z
    Kordesch, ME
    Jadwisienzak, WM
    Lozykowski, HJ
    Halverson, W
    Colter, PC
    MICROCRYSTALLINE AND NANOCRYSTALLINE SEMICONDUCTORS-1998, 1999, 536 : 245 - 250
12345