Low temperature ECR-plasma assisted MOCVD microcrystalline and amorphous GaN deposition and characterization for electronic devices

被引：0
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作者：
Hassan, Z. [1 ]
Kordesch, M.E. [1 ]
Jadwisffinzak, W.M. [1 ]
Lozykowski, H.J. [1 ]
Halverson, W. [1 ]
Colter, P.C. [1 ]
机构：
[1] Department of Physics and Astronomy, Ohio University, Athens, OH, United States
来源：
Materials Research Society Symposium - Proceedings | 1999年 / 536卷
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