Metrology for emerging devices and materials

被引：0
|
作者：
Vogel, EM [1 ]
机构：
[1] Natl Inst Stand & Technol, CMOS, Gaithersburg, MD 20899 USA
来源：
Characterization and Metrology for ULSI Technology 2005 | 2005年 / 788卷
关键词：
nanoelectronics; emerging devices; beyond CMOS;
D O I：
暂无
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
As silicon CMOS technology approaches its limits, new device structures and computational paradigms will be required to replace and augment standard CMOS devices for ULSI circuits. The extreme sensitivity of the electronic proper-ties of these devices to their nanoscale physical properties defines a significant need for precise metrology. This paper provides an overview of the characterization requirements for these technologies.
引用
收藏
页码：650 / 655
页数：6
相关论文
共 50 条
  • [1] Metrology for emerging research materials and devices
    Garner, C. Michael
    Herr, Dan
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 34 - +
  • [2] Metrology challenges for emerging research devices and materials
    Garner, C. Michael
    Vogel, Eric M.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2006, 19 (04) : 397 - 403
  • [3] Metrology for Emerging Materials, Devices, and Structures: The Example of Graphene
    Diebold, Alain C.
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2009, 2009, 1173 : 3 - 11
  • [4] Metrology and Characterization Challenges for Emerging Research Materials and Devices
    Garner, C. Michael
    Herr, Dan
    Obeng, Yaw
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2011, 2011, 1395
  • [5] Infrared metrology for spintronic materials and devices
    Vopsaroiu, M.
    Stanton, T.
    Thomas, O.
    Cain, M.
    Thompson, S. M.
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2009, 20 (04)
  • [6] Technology and metrology of new electronic materials and devices
    Vogel, Eric M.
    NATURE NANOTECHNOLOGY, 2007, 2 (01) : 25 - 32
  • [7] Metrology for Advanced Transistor and Memristor Devices and Materials
    Diebold, Alain C.
    Cady, Nathaniel C.
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV, 2020, 11325
  • [8] Technology and metrology of new electronic materials and devices
    Eric Vogel
    Nature Nanotechnology, 2007, 2 : 25 - 32
  • [9] Nanoscale imaging and metrology of devices and innovative materials
    Spinella, Corrado
    Raineri, Vito
    Vandervorst, Wilfried
    Ciappa, Mauro
    MICROELECTRONIC ENGINEERING, 2007, 84 (03) : 375 - 375
  • [10] Emerging Photovoltaic Materials and Devices
    Zhao, Kui
    Yang, Zhou
    Liu, Shengzhong
    ADVANCED FUNCTIONAL MATERIALS, 2019, 29 (47)
12345