Electrochemical micromachining of titanium through a patterned oxide film

被引：25
|
作者：
Chauvy, PF [1 ]
Madore, C [1 ]
Landolt, D [1 ]
机构：
[1] Ecole Polytech Fed Lausanne, Lab Met Chim, Dept Mat, CH-1015 Lausanne, Switzerland
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 1999年 / 2卷 / 03期
关键词：
D O I：
10.1149/1.1390755
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Electrochemical micromachining of titanium through a patterned oxide film (oxyresist) has been achieved in a sulfuric acidmethanol-based electropolishing electrolyte. The patterned oxide film was formed in an aqueous 0.5 M sulfuric acid solution by selective anodic oxidation of titanium through a photoresist mask. Electrochemical dissolution through the patterned oxide film yielded well-defined grooves comparable to those obtained by etching directly through a photoresist mask. The described process eliminates the need for photoresists to be chemically stable in aggressive electropolishing electrolytes. It increases significantly the flexibility of implementation of electrochemical micromachining of valve metals. (C) 1999 The Electrochemical Society. S1099-0062(98)11-024-6 All rights reserved.
引用
收藏
页码：123 / 125
页数：3
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