The effect of sulfur on the electrical properties of S and N co-doped ZnO thin films: experiment and first-principles calculations

被引:17
|
作者
Niu, Wenzhe [1 ]
Xu, Hongbin [1 ]
Guo, Yanmin [2 ]
Li, Yaguang [1 ]
Ye, Zhizhen [1 ]
Zhu, Liping [1 ]
机构
[1] Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310003, Zhejiang, Peoples R China
[2] Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
基金
中国国家自然科学基金;
关键词
P-TYPE CONDUCTIVITY; EPITAXY;
D O I
10.1039/c5cp02434j
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
P-type sulphur-nitrogen (S-N) co-doped ZnO thin films are deposited and the effect of sulphur on the electrical properties is discussed. First-principles calculations indicate that the structure is most stable when the S atom is close to the N atom in the (0002) plane, implying that dual-doped ZnO is relatively feasible to approach. The partial density of states of S-N co-doped ZnO shows that the S impurity plays a vital role in forming the p-type conductivity.
引用
收藏
页码:16705 / 16708
页数:4
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