Reaction of Ta(NMe2)5 with O2:: Mechanistic studies of the formation of microelectronic Ta2O5 thin films

被引：0
|
作者：
Chen, SJ
Wang, RT
Yu, XH
Qiu, H
Guzei, IA
Xue, ZL
机构：
[1] Univ Tennessee, Dept Chem, Knoxville, TN 37996 USA
[2] Univ Wisconsin, Dept Chem, Madison, WI 53706 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 229卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
655-INOR
引用
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页码：U1063 / U1063
页数：1
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