Level-set strategy for inverse DSA-lithography

被引:6
|
作者
Ouaknin, Gaddiel Y. [1 ]
Laachi, Nabil [5 ]
Delaney, Kris [5 ]
Fredrickson, Glenn H. [3 ,4 ,5 ]
Gibou, Frederic [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Dept Mech Engn, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Comp Sci, Santa Barbara, CA 93106 USA
[3] Univ Calif Santa Barbara, Dept Chem Engn, Santa Barbara, CA 93106 USA
[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[5] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
基金
美国国家科学基金会;
关键词
Level-set; SCFT; Inverse problems; DSA; Lithography; Shape optimization; BLOCK-COPOLYMER; IRREGULAR DOMAINS; HOMOPOLYMER; POLYMERS; SIMULATIONS; CURVATURE; ALGORITHM; DIFFUSION; EQUATION;
D O I
10.1016/j.jcp.2018.09.021
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
We introduce a level-set strategy to find the geometry of confinement that will guide the self-assembly of block copolymers to a given target design in the context of lithography. The methodology is based on a shape optimization algorithm, where the level-set normal velocity is defined as the pressure field computed through a self-consistent field theory simulation. We present numerical simulations that demonstrate that this methodology is capable of finding guiding templates for a variety of target arrangements of cylinders and thus is an effective approach to the inverse directed self-assembly problem. (C) 2018 Elsevier Inc. All rights reserved.
引用
收藏
页码:1159 / 1178
页数:20
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