Level-set strategy for inverse DSA-lithography

被引:6
|
作者
Ouaknin, Gaddiel Y. [1 ]
Laachi, Nabil [5 ]
Delaney, Kris [5 ]
Fredrickson, Glenn H. [3 ,4 ,5 ]
Gibou, Frederic [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Dept Mech Engn, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Comp Sci, Santa Barbara, CA 93106 USA
[3] Univ Calif Santa Barbara, Dept Chem Engn, Santa Barbara, CA 93106 USA
[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[5] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
基金
美国国家科学基金会;
关键词
Level-set; SCFT; Inverse problems; DSA; Lithography; Shape optimization; BLOCK-COPOLYMER; IRREGULAR DOMAINS; HOMOPOLYMER; POLYMERS; SIMULATIONS; CURVATURE; ALGORITHM; DIFFUSION; EQUATION;
D O I
10.1016/j.jcp.2018.09.021
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
We introduce a level-set strategy to find the geometry of confinement that will guide the self-assembly of block copolymers to a given target design in the context of lithography. The methodology is based on a shape optimization algorithm, where the level-set normal velocity is defined as the pressure field computed through a self-consistent field theory simulation. We present numerical simulations that demonstrate that this methodology is capable of finding guiding templates for a variety of target arrangements of cylinders and thus is an effective approach to the inverse directed self-assembly problem. (C) 2018 Elsevier Inc. All rights reserved.
引用
收藏
页码:1159 / 1178
页数:20
相关论文
共 50 条
  • [1] Block-based inverse lithography technology with adaptive level-set algorithm
    Huang, Chaojun
    Ma, Xu
    Zhang, Shengen
    Lin, Mu
    Porras-Diaz, Nestor
    Arce, Gonzalo R.
    OPTICS AND LASER TECHNOLOGY, 2025, 182
  • [2] Accelerating polymer self-consistent field simulation and inverse DSA-lithography with deep neural networks
    Wang, Haolan
    Li, Sikun
    Zeng, Jiale
    Zhang, Tao
    JOURNAL OF CHEMICAL PHYSICS, 2025, 162 (10):
  • [3] Crack reconstruction using a level-set strategy
    Alvarez, Diego
    Dorn, Oliver
    Irishina, Natalia
    Moscoso, Miguel
    JOURNAL OF COMPUTATIONAL PHYSICS, 2009, 228 (16) : 5710 - 5721
  • [4] On multiple level-set regularization methods for inverse problems
    DeCezaro, A.
    Leitao, A.
    Tai, X-C
    INVERSE PROBLEMS, 2009, 25 (03)
  • [5] Level-set function approach to an inverse interface problem
    Ito, K
    Kunisch, K
    Li, ZL
    INVERSE PROBLEMS, 2001, 17 (05) : 1225 - 1242
  • [6] An Accelerated Level-Set Method for Inverse Scattering Problems
    Audibert, Lorenzo
    Haddar, Houssem
    Liu, Xiaoli
    SIAM JOURNAL ON IMAGING SCIENCES, 2022, 15 (03): : 1576 - 1600
  • [7] Parametric level-set inverse problems with stochastic background estimation
    Belliveau, Patrick
    Haber, Eldad
    INVERSE PROBLEMS, 2023, 39 (07)
  • [8] Robust level-set-based inverse lithography
    Shen, Yijiang
    Jia, Ningning
    Wong, Ngai
    Lam, Edmund Y.
    OPTICS EXPRESS, 2011, 19 (06): : 5511 - 5521
  • [9] Triply periodic bicontinuous structures through interference lithography: a level-set approach
    Ullal, CK
    Maldovan, M
    Wohlgemuth, M
    Thomas, EL
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 2003, 20 (05) : 948 - 954
  • [10] Level-set-based inverse lithography for photomask synthesis
    Shen, Yijiang
    Wong, Ngai
    Lam, Edmund Y.
    OPTICS EXPRESS, 2009, 17 (26): : 23690 - 23701