Large-area hard magnetic L10-FePt nanopatterns by nanoimprint lithography

被引:40
|
作者
Bublat, T. [1 ]
Goll, D. [1 ,2 ]
机构
[1] Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany
[2] Aalen Univ, Mat Res Inst, D-73430 Aalen, Germany
关键词
FEPT THIN-FILMS; RECORDING MEDIA; PATTERNED MEDIA; FABRICATION; RESISTS; ARRAYS;
D O I
10.1088/0957-4484/22/31/315301
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Large-area hard magnetic L1(0)-FePt nanopatterns with out-of-plane texture were fabricated by using a top-down approach. For the fabrication process, ultraviolet nanoimprint lithography (UV-NIL) in combination with inductively coupled plasma reactive Ar-ion etching was used. By this technique a continuous L1(0)-Fe51Pt49 film was nanostructured into a regular arrangement of nanodots over an area of 4 mm(2). The dot dimension and distribution was specified by the stamp, resulting in a dot size of 60 nm and a periodicity of 150 nm. For the large-scale L1(0)-FePt nanopatterns, huge coercivities up to 4.31 T could be achieved. By means of magnetic force microscopy it could be verified that the nanodots were magnetically decoupled from each other and occurred in the single-domain state with perpendicular magnetization.
引用
收藏
页数:6
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