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Large-area hard magnetic L10-FePt nanopatterns by nanoimprint lithography
被引:40
|作者:
Bublat, T.
[1
]
Goll, D.
[1
,2
]
机构:
[1] Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany
[2] Aalen Univ, Mat Res Inst, D-73430 Aalen, Germany
关键词:
FEPT THIN-FILMS;
RECORDING MEDIA;
PATTERNED MEDIA;
FABRICATION;
RESISTS;
ARRAYS;
D O I:
10.1088/0957-4484/22/31/315301
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Large-area hard magnetic L1(0)-FePt nanopatterns with out-of-plane texture were fabricated by using a top-down approach. For the fabrication process, ultraviolet nanoimprint lithography (UV-NIL) in combination with inductively coupled plasma reactive Ar-ion etching was used. By this technique a continuous L1(0)-Fe51Pt49 film was nanostructured into a regular arrangement of nanodots over an area of 4 mm(2). The dot dimension and distribution was specified by the stamp, resulting in a dot size of 60 nm and a periodicity of 150 nm. For the large-scale L1(0)-FePt nanopatterns, huge coercivities up to 4.31 T could be achieved. By means of magnetic force microscopy it could be verified that the nanodots were magnetically decoupled from each other and occurred in the single-domain state with perpendicular magnetization.
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页数:6
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