Electrical, Optical, and Mechanical Properties of Amorphous Hydrogenated Carbon Obtained under Various Deposition Conditions

被引:1
|
作者
Babaev, A. A. [1 ]
Sultanov, S. B. [1 ]
Abdulvagabov, M. Sh. [2 ]
Terukov, E. I. [3 ]
机构
[1] Russian Acad Sci, Dagestan Sci Ctr, Inst Phys, Makhachkala 367003, Dagestan, Russia
[2] Dagestan State Univ, Makhachkala 367025, Dagestan, Russia
[3] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
关键词
C-H FILMS; LIQUID-CRYSTAL; DIAMOND-LIKE;
D O I
10.1134/S1063782611010039
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Activation energy of dc conductivity, refractive index, and microhardness of amorphous hydrogenated carbon films a-C:H have been studied. The films are produced from a methane-argon mixture under various deposition conditions on quartz and silicon substrates: E/p = 40-180 V/mPa (E is the electric-field strength in the space between the electrodes, and p is the gas mixture pressure in the chamber) and substrate temperature T-s = 50-300 degrees C. In these deposition conditions, diamond-like, polymer-like, and graphite-like a-C:H films can be obtained with widely varying activation energy of conductivity, microhardness, and refractive index.
引用
收藏
页码:118 / 120
页数:3
相关论文
共 50 条
  • [31] Structural, optical, and electrical properties of hydrogenated amorphous silicon germanium alloys
    Chou, YP
    Lee, SC
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (08) : 4111 - 4123
  • [32] Electrical Conduction Properties of Hydrogenated Amorphous Carbon Films with Different Structures
    Tomidokoro, Masashi
    Tunmee, Sarayut
    Rittihong, Ukit
    Euaruksakul, Chanan
    Supruangnet, Ratchadaporn
    Nakajima, Hideki
    Hirata, Yuki
    Ohtake, Naoto
    Akasaka, Hiroki
    MATERIALS, 2021, 14 (09)
  • [33] THE EFFECT OF NITROGENATION ON THE ELECTRICAL-PROPERTIES OF AMORPHOUS HYDROGENATED CARBON LAYERS
    STENZEL, O
    VOGEL, M
    PONITZ, S
    PETRICH, R
    WALLENDORF, T
    VONBORCZYSKOWSKI, C
    ROZPLOCH, F
    KRASILNIK, Z
    KALUGIN, N
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1993, 140 (01): : 179 - 188
  • [34] CHEMICAL MODIFICATION OF THE ELECTRICAL PROPERTIES OF HYDROGENATED AMORPHOUS CARBON FILMS.
    Meyerson, B.
    Smith, F.W.
    Solar energy, 1980, 34 (07) : 531 - 534
  • [35] Large area deposition of hydrogenated amorphous carbon films for optical storage disks
    Piazza, F
    Grambole, D
    Zhou, L
    Talke, F
    Casiraghi, C
    Ferrari, AC
    Robertson, J
    DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) : 1505 - 1510
  • [36] A comparative study of the nanoscratching behavior of amorphous carbon films grown under various deposition conditions
    Charitidis, C
    Logothetidis, S
    Gioti, M
    SURFACE & COATINGS TECHNOLOGY, 2000, 125 (1-3): : 201 - 206
  • [37] ELECTRICAL-CONDUCTIVITY OF AMORPHOUS-CARBON AND AMORPHOUS HYDROGENATED CARBON
    DASGUPTA, D
    DEMICHELIS, F
    TAGLIAFERRO, A
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1991, 63 (06): : 1255 - 1266
  • [38] On the microstructural, optical and mechanical properties of hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma
    Durand-Drouhin, O
    Zeinert, A
    Benlahsen, M
    Zellama, K
    Kré, R
    Turban, G
    Grosman, A
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 752 - 755
  • [39] OPTICAL AND MECHANICAL-PROPERTIES OF HARD HYDROGENATED AMORPHOUS-CARBON FILMS DEPOSITED BY PLASMA CVD
    YOKOYAMA, H
    OKAMOTO, M
    YAMASAKI, T
    TAKAHIRO, K
    OSAKA, Y
    IMURA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (12): : 2815 - 2819
  • [40] DEPOSITION CONDITIONS RELATED TO THE CHEMICAL AND OPTICAL-PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
    PERRIN, J
    DREVILLON, B
    TOULEMONDE, M
    ANNALS OF THE NEW YORK ACADEMY OF SCIENCES, 1983, 410 (JUL) : 47 - 62