Polymer Material as a Gate Dielectric for Graphene Field-Effect-Transistor Applications

被引:5
|
作者
Jung, Myung-Ho [1 ]
Handa, Hiroyuki [1 ]
Takahashi, Ryota [1 ]
Fukidome, Hirokazu [1 ]
Suemitsu, Tetsuya [1 ,2 ]
Otsuji, Taiichi [1 ,2 ]
Suemitsu, Maki [1 ,2 ]
机构
[1] Tohoku Univ, Res Inst Elect Commun, Sendai, Miyagi 9808577, Japan
[2] Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1070075, Japan
基金
日本学术振兴会;
关键词
THIN-FILM TRANSISTORS; GRAPHITE;
D O I
10.1143/JJAP.50.070107
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial-graphene field-effect transistor (EG-FET) with a polymer gate dielectric was fabricated and their electrical characteristics were investigated. The epitaxial graphene layer was formed on a semi-insulating 6H-SiC substrate by a high-temperature annealing in ultrahigh vacuum. The formation of graphene was confirmed by low-energy electron diffraction (LEED), Raman-scattering spectroscopy and X-ray photoelectron spectroscopy (XPS). The polymer gate dielectric (ZEP520a) layer was formed by spin coating, which exhibits good dielectric properties without noticeable structural degradation of the graphene layer. The EG-FETs with this polymer gate dielectric shows an n-type characteristic, with the field-effect mobility of 580 cm(2) V-1 s(-1). (C) 2011 The Japan Society of Applied Physics
引用
收藏
页数:5
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