Kinetics of laser induced changes of characteristic optical properties in Lithosil® with 193nm excimer laser exposure

被引：10
|
作者：
Natura, U [1 ]
Martin, R [1 ]
von der Goenna, G [1 ]
Kahlke, M [1 ]
Fasold, G [1 ]
机构：
[1] SCHOTT Lithotec AG, D-07745 Jena, Germany
来源：
Optical Microlithography XVIII, Pts 1-3 | 2005年 / 5754卷
关键词：
defect generation; fused silica; rapid damage process; pre-irradiation effect;
D O I：
10.1117/12.599319
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Fused silica is used as lens material in DUV microlithography systems. The kinetics of slow radiation induced defect generation in Lithosil (R) including absorption, hydrogen consumption and changes of the refractive index is described in detail and in very good agreement with measured data in previous papers. In addition to these effects after long time irradiation fused silica is characterized by rapid damage processes (RDP) after short time irradiation. A model describing the absorption of RDP in dependence on energy density, repetition rate and time is described in this paper, the sensitivity of RDP on pre-irradiation and illumination conditions is discussed. Furthermore a method to reduce energy dependent absorption of RDP is mentioned.
引用
收藏
页码：1312 / 1319
页数：8
相关论文
共 50 条
  • [21] Microfiber bragg grating inscribed using 193nm excimer laser for refractive index sensing
    Ran, Yang
    Sun, Li-Peng
    Gao, Shuai
    Quan, Zhan
    Li, Jie
    Jin, Long
    Guan, Bai-Ou
    THIRD ASIA PACIFIC OPTICAL SENSORS CONFERENCE, 2012, 8351
  • [22] Study on damage of MgF2 window irradiated by 193nm ultraviolet excimer laser
    Guo, Yanting
    Lv, Tonglin
    Yan, Rui
    Li, Xin
    Wang, Xi
    PACIFIC RIM LASER DAMAGE 2021: OPTICAL MATERIALS FOR HIGH-POWER LASERS, 2021, 11912
  • [23] Echelle and etalon used for spectral metrology of excimer laser lithographic light sources at 193nm
    Gao Fei
    Zhao Jiangshan
    Liu Guangyi
    Wang Qian
    Bai Lujun
    AOPC 2015: MICRO/NANO OPTICAL MANUFACTURING TECHNOLOGIES; AND LASER PROCESSING AND RAPID PROTOTYPING TECHNIQUES, 2015, 9673
  • [24] Cleaving of polymer optical fiber by 193-nm excimer laser
    Luo, Xianfeng
    You, Libing
    Luo, Le
    Fang, Xiaodong
    OPTICAL FIBER TECHNOLOGY, 2020, 54 (54)
  • [25] 193 NM EXCIMER LASER ABLATION OF BONE
    LUSTMANN, J
    ULMANSKY, M
    FUXBRUNNER, A
    LEWIS, A
    LASERS IN SURGERY AND MEDICINE, 1991, 11 (01) : 51 - 57
  • [26] MUTAGENIC POTENTIAL OF A 193 NM EXCIMER LASER
    TRENTACOSTE, J
    THOMPSON, K
    PARRISH, R
    HAJEK, A
    BERMAN, M
    GANJEI, P
    LASERS IN SURGERY AND MEDICINE, 1987, 7 (01) : 127 - 127
  • [27] ArF excimer laser for 193 nm lithography
    Stamm, U
    Patzel, R
    Kleinschmidt, J
    Vogler, K
    Zschocke, W
    Bragin, I
    Basting, D
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 1010 - 1013
  • [28] ArF excimer laser for 193 nm lithography
    Stamm, U
    Kleinschmidt, J
    Heist, P
    Bragin, I
    Patzel, R
    Basting, D
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 868 - 873
  • [29] 193 NM EXCIMER LASER PHOTOTHERAPEUTIC KERATECTOMY
    STARK, WJ
    GOODMAN, GL
    GILBERT, ML
    GOTTSCH, JD
    KAMP, MT
    ENGER, C
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 1991, 32 (04) : 720 - 720
  • [30] Micro-structuring with 193nm laser radiation
    Zhang, L
    Lou, QH
    Wei, YR
    Huang, F
    CHALLENGES IN PROCESS INTEGRATION AND DEVICE TECHNOLOGY, 2000, 4181 : 248 - 253
12345