Photoluminescence at 1.54 μm of Er-doped hydrogenated amorphous silicon

被引:0
|
作者
Bresler, M
Gusev, O
Kuznetsov, A
Kudoyarova, V
Terukov, E
Yassievich, I
Fuhs, W
Ulber, I
Weiser, G
机构
[1] AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
[2] Hahn Meitner Inst Kernforsch Berlin GmbH, Abt Photovolta, D-12489 Berlin, Germany
[3] Univ Marburg, Fachbereich Phys, D-35032 Marburg, Germany
基金
俄罗斯基础研究基金会;
关键词
photoluminescence; Er-doped amorphous hydrogenated silicon; light absorption;
D O I
10.1016/S0022-3093(98)00240-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Photoluminescence (PL) and light absorption of Er-doped amorphous hydrogenated silicon samples are measured at 77-300 K. The temperature dependence of luminescence of erbium ions in a-Si:H(Er) is compared with that of intrinsic PL of a-Si:H. The lifetime of excited erbium ions in this amorphous matrix changes from 20 to 8 mu s in this temperature range. We propose a defect-related Auger excitation (DRAE) mechanism of erbium luminescence and demonstrate that it is consistent with the whole set of our experimental results. The temperature quenching of the erbium luminescence observed above 200 K, with the activation energy of 250 meV, results from the competition of the DRAE and multiphonon nonradiative defect processes for D-0 + e --> D- transition. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:394 / 398
页数:5
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