Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition

被引：4
|
作者：
Zerov, VY [1 ]
Kulikov, YV
Malyarov, VG
Feoktistov, NA
Khrebtov, IA
机构：
[1] SI Vavilov State Opt Inst, St Petersburg, Russia
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 196140, Russia
来源：
TECHNICAL PHYSICS LETTERS | 1997年 / 23卷 / 06期
基金：
俄罗斯基础研究基金会;
关键词：
D O I：
10.1134/1.1261722
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A method of fabricating uncooled thermally sensitive sandwich structures based on amorphous hydrated silicon films is discussed and experimental results are reported. The structures have an area of 10(-4) cm(2), a resistance of congruent to 10 k Ohm, and a temperature coefficient of resistance similar or equal to 2%/K. At 30 Hz and a current of similar or equal to 1 mu A, the excess noise exceeds the thermal resistance noise by a factor of 1.7. (C) 1997 American Institute of Physics. [S1063-7850(97)02706-7].
引用
收藏
页码：481 / 483
页数：3
相关论文
共 50 条
  • [31] Simulation of Vapor-Phase Deposition and Growth of a Pentacene Thin Film on C60 (001)
    Muccioli, Luca
    D'Avino, Gabriele
    Zannoni, Claudio
    ADVANCED MATERIALS, 2011, 23 (39) : 4532 - +
  • [32] Nanoscale Mn3O4 Thin Film Photoelectrodes Fabricated by a Vapor-Phase Route
    Gasparotto, Alberto
    Maccato, Chiara
    Petala, Athanasia
    Bebelis, Symeon
    Sada, Cinzia
    Kondarides, Dimitris, I
    Barreca, Davide
    ACS APPLIED ENERGY MATERIALS, 2019, 2 (11): : 8294 - 8302
  • [33] INVESTIGATION OF ORIENTED SILICON FILMS OBTAINED BY VAPOR-PHASE DEPOSITION
    SHAROVATOV, AI
    MIKHAILOVA, AY
    SANYGIN, VP
    PADALKO, AG
    LAZAREV, VB
    INORGANIC MATERIALS, 1993, 29 (05) : 671 - 674
  • [34] Morphology control and material mixing by high-temperature organic vapor-phase deposition and its application to thin-film solar cells
    Yang, F
    Shtein, M
    Forrest, SR
    JOURNAL OF APPLIED PHYSICS, 2005, 98 (01)
  • [35] DIFFRACTIVE MICROLENSES WITH ANTIREFLECTION COATINGS FABRICATED BY THIN-FILM DEPOSITION
    PAWLOWSKI, E
    ENGEL, H
    FERSTL, M
    FURST, W
    KUHLOW, B
    OPTICAL ENGINEERING, 1994, 33 (02) : 647 - 652
  • [36] Study on Stability of Amorphous Silicon Thin-Film Transistors Prepared by Catalytic Chemical Vapor Deposition
    Nishizaki, Shogo
    Ohdaira, Keisuke
    Matsumura, Hideki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (12) : 8700 - 8706
  • [37] Conformal thin-film silicon nitride deposited by hot-wire chemical vapor deposition
    Wang, Q
    Ward, S
    Gedvilas, L
    Keyes, B
    Sanchez, E
    Wang, SL
    APPLIED PHYSICS LETTERS, 2004, 84 (03) : 338 - 340
  • [38] Transient Phenomena in Plasma-Enhanced Chemical Vapor Deposition Processes of Thin-Film Silicon
    Nunomura, Shota
    Yoshida, Isao
    Kondo, Michio
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (10) : 1061021 - 1061025
  • [39] AMORPHOUS-SILICON THIN-FILM TRANSISTORS USING CHEMICAL VAPOR-DEPOSITION OF DISILANE
    BREDDELS, PA
    KANOH, H
    SUGIURA, O
    MATSUMURA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (10): : L1750 - L1752
  • [40] Computational Investigation of Silicon Thin-Film Solar Cells with Grating Structures fabricated by Holographic Lithography
    Theuring, Martin
    Lacombe, Juergen
    Chakanga, Kambulakwao
    Huenig, Ruben
    Huska, Klaus
    Vehse, Martin
    von Maydell, Karsten
    Lemmer, Uli
    Agert, Carsten
    PHOTONICS FOR SOLAR ENERGY SYSTEMS IV, 2012, 8438
12345