Device performance of ferroelectric/correlated oxide heterostructures for non-volatile memory applications

被引:57
|
作者
Hoffman, J. [1 ,2 ]
Hong, X. [3 ]
Ahn, C. H. [1 ,2 ]
机构
[1] Yale Univ, Dept Appl Phys, New Haven, CT 06511 USA
[2] Yale Univ, CRISP, New Haven, CT 06511 USA
[3] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
基金
美国国家科学基金会;
关键词
FIELD-EFFECT TRANSISTOR; MOTT TRANSITION;
D O I
10.1088/0957-4484/22/25/254014
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ferroelectric field effect devices offer the possibility of non-volatile data storage. Attempts to integrate perovskite ferroelectric materials with silicon semiconductors, however, have been largely unsuccessful in creating non-volatile, nondestructive read memory elements because of difficulties in controlling the ferroelectric/semiconductor interface. Correlated oxide systems have been explored as alternative channel materials to form all-perovskite field effect devices. We examine a non-volatile memory using an electric-field-induced metal-insulator transition in PbZr0.2Ti0.8O3/La1-xSrxMnO3 (PZT/LSMO), PZT/La1-xCaxMnO3 (PZT/LCMO) and PZT/La1-xSrxCoO3 (PZT/LSCO) devices. The performance of these devices in the areas of switching time and retention are discussed.
引用
收藏
页数:4
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