Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation

被引：3
|
作者：
Wang, Junwu [1 ]
Wang, Xinbing [1 ]
Zuo, Duluo [1 ]
机构：
[1] Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Wuhan 430074, Peoples R China
来源：
FRONTIERS OF OPTOELECTRONICS | 2021年 / 14卷 / 03期
关键词：
extreme ultraviolet (EUV) radiation; laser induced discharge plasma; optical emission spectroscopy; electron temperature and density;
D O I：
10.1007/s12200-020-0964-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, a CO2 laser induced discharge plasma extreme ultraviolet (EUV) source experimental device was established. The optical emission spectroscopy was used to diagnose the characteristics of the plasma, and the evolution of electron temperature and electron density with time was obtained. The influence of discharge voltage on plasma parameters was analyzed and discussed. The EUV radiation characteristics of the plasma were investigated by self-made grazing incidence EUV spectrometer. The EUV radiation intensity and conversion efficiency were discussed.
引用
收藏
页码：352 / 359
页数：8
相关论文
共 50 条
  • [41] Liquid Tin Droplet Generator in Laser-Produced Plasma Extreme Ultraviolet Source: A Review
    Sun, Qin
    Qi, Huiming
    Wang, Xinbing
    Zuo, Duluo
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2024, 73 : 1 - 1
  • [42] Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography
    White, J.
    O'Sullivan, G.
    Zakharov, S.
    Choi, P.
    Zakharov, V.
    Nishimura, H.
    Fujioka, S.
    Nishihara, K.
    APPLIED PHYSICS LETTERS, 2008, 92 (15)
  • [43] Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma
    Chen, Hong
    Wang, Xinbing
    Duan, Lian
    Lan, Hui
    Chen, Ziqi
    Zuo, Duluo
    Lu, Peixiang
    JOURNAL OF APPLIED PHYSICS, 2015, 117 (19)
  • [44] 13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources
    Hayden, P
    Cummings, A
    Murphy, N
    O'Sullivan, G
    Sheridan, P
    White, J
    Dunne, P
    JOURNAL OF APPLIED PHYSICS, 2006, 99 (09)
  • [45] Absorption of laser radiation by femtosecond laser-induced plasma of air and its emission characteristics
    Ilyin, A. A.
    Golik, S. S.
    Shmirko, K. A.
    21ST INTERNATIONAL SYMPOSIUM ON ATMOSPHERIC AND OCEAN OPTICS: ATMOSPHERIC PHYSICS, 2015, 9680
  • [46] Characteristics of Extreme Ultraviolet and Debris Emission From Laser Produced Bi Plasma
    Xie Zhuo
    Wang Hai-jian
    Dou Yin-ping
    Song Xiao-wei
    Lin Jing-quan
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2022, 42 (07) : 2056 - 2062
  • [47] Pinch plasma radiation sources for the extreme ultraviolet
    Neff, W
    Bergmann, K
    Rosier, O
    Lebert, R
    Juschkin, L
    CONTRIBUTIONS TO PLASMA PHYSICS, 2001, 41 (06) : 589 - 597
  • [48] The effects of the prepulse on capillary discharge extreme ultraviolet laser
    Shuker, M
    Ben-kish, A
    Nemirovsky, RA
    Fisher, A
    Ron, A
    PHYSICS OF PLASMAS, 2006, 13 (01) : 1 - 4
  • [49] Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
    Bergmann, K
    Schriever, G
    Rosier, O
    Muller, M
    Neff, W
    Lebert, R
    APPLIED OPTICS, 1999, 38 (25) : 5413 - 5417
  • [50] HEIGHTS initial simulation of discharge produced plasma hydrodynamics and radiation transport for extreme ultraviolet lithography
    Hassanein, A
    Sizyuk, V
    Tolkach, V
    Morozov, V
    Rice, B
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (01): : 130 - 138
12345