Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation

被引：3
|
作者：
Wang, Junwu [1 ]
Wang, Xinbing [1 ]
Zuo, Duluo [1 ]
机构：
[1] Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Wuhan 430074, Peoples R China
来源：
FRONTIERS OF OPTOELECTRONICS | 2021年 / 14卷 / 03期
关键词：
extreme ultraviolet (EUV) radiation; laser induced discharge plasma; optical emission spectroscopy; electron temperature and density;
D O I：
10.1007/s12200-020-0964-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, a CO2 laser induced discharge plasma extreme ultraviolet (EUV) source experimental device was established. The optical emission spectroscopy was used to diagnose the characteristics of the plasma, and the evolution of electron temperature and electron density with time was obtained. The influence of discharge voltage on plasma parameters was analyzed and discussed. The EUV radiation characteristics of the plasma were investigated by self-made grazing incidence EUV spectrometer. The EUV radiation intensity and conversion efficiency were discussed.
引用
收藏
页码：352 / 359
页数：8
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