MODEL-BASED RUN-TO-RUN OPTIMIZATION FOR PROCESS DEVELOPMENT

被引:1
|
作者
Luna, Martin F. [1 ]
Martinez, Ernesto C. [1 ]
机构
[1] INGAR CONICET UTN, S3002 GJC, RA-3657 Avellaneda, Santa Fe, Argentina
关键词
Process system engineering; Process development; Experimental design; Modeling for optimization; PROBABILISTIC TENDENCY MODELS; RESEARCH-AND-DEVELOPMENT; ONLINE OPTIMIZATION; DESIGN; PRODUCTIVITY; STRATEGIES;
D O I
10.1590/0104-6632.20180353s20170212
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Research and development of new processes is a fundamental part of any innovative industry. For process engineers, finding optimal operating conditions for new processes from the early stages is a main issue, since it improves economic viability, helps others areas of R&D by avoiding product bottlenecks and shortens the time-to-market period. Model-based optimization strategies are helpful in doing so, but imperfect models with parametric or structural errors can lead to suboptimal operating conditions. In this work, a methodology that uses probabilistic tendency models that are constantly updated through experimental feedback is proposed in order to rapidly and efficiently find improved operating conditions. Characterization of the uncertainty is used to make safe predictions even with scarce data, which is typical in this early stage of process development. The methodology is tested with an example from the traditional innovative pharmaceutical industry.
引用
收藏
页码:1063 / 1079
页数:17
相关论文
共 50 条
  • [41] Impact of multi-product and -process manufacturing on run-to-run control
    Miller, ML
    PROCESS, EQUIPMENT, AND MATERIALS CONTROL IN INTEGRATED CIRCUIT MANUFACTURING III, 1997, 3213 : 138 - 146
  • [42] Run-to-run control schemes for CMP process subject to deterministic drifts
    Guo, RS
    Chen, AG
    Chen, JJ
    2000 SEMICONDUCTOR MANUFACTURING TECHNOLOGY WORKSHOP, 2000, : 251 - 258
  • [43] Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
    Da, L
    Kumar, VG
    Tay, A
    Mamun, AA
    Ho, WK
    See, A
    Chan, L
    PROCEEDINGS OF THE 2002 IEEE INTERNATIONAL SYMPOSIUM ON INTELLIGENT CONTROL, 2002, : 740 - 745
  • [44] Run-to-run process control of oxide CMP using integrated metrology
    Satyavolu, SPR
    Stefani, J
    Comstock, S
    Larsen, J
    Paquette, B
    Wang, M
    ISSM 2000: NINTH INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, PROCEEDINGS, 2000, : 411 - 414
  • [45] Run-to-Run Fault Detection based on ARX Model and PCA for Semiconductor Manufacturing Processes
    Wang, Yan
    Zheng, Ying
    Xu, Chengjie
    PROCEEDINGS OF THE 31ST CHINESE CONTROL CONFERENCE, 2012, : 5271 - 5274
  • [46] Integrated run-to-run and on-line model-based control of particle size distribution for a semi-batch precipitation reactor
    Lee, K
    Lee, JH
    Yang, DR
    Mahoney, AW
    COMPUTERS & CHEMICAL ENGINEERING, 2002, 26 (7-8) : 1117 - 1131
  • [47] A probabilistic approach to run-to-run control
    Hamby, ES
    Kabamba, PT
    Khargonekar, PP
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1998, 11 (04) : 654 - 669
  • [48] A comparison of Run-to-Run Control algorithms
    Campbell, WJ
    Firth, SK
    Toprac, AJ
    Edgar, TF
    PROCEEDINGS OF THE 2002 AMERICAN CONTROL CONFERENCE, VOLS 1-6, 2002, 1-6 : 2150 - 2155
  • [49] Monitoring of a sampled process data under Run-to-Run control: application to a semiconductor process
    Korabi, Taki Eddine
    Graton, Guillaume
    El Adel, El Mostafa
    Ouladsine, Mustapha
    Pinaton, Jacques
    2019 IEEE 15TH INTERNATIONAL CONFERENCE ON AUTOMATION SCIENCE AND ENGINEERING (CASE), 2019, : 930 - 935
  • [50] Run-to-run control charts with contrasts
    Runger, GC
    Fowler, JW
    QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL, 1998, 14 (04) : 261 - 272