MODEL-BASED RUN-TO-RUN OPTIMIZATION FOR PROCESS DEVELOPMENT

被引:1
|
作者
Luna, Martin F. [1 ]
Martinez, Ernesto C. [1 ]
机构
[1] INGAR CONICET UTN, S3002 GJC, RA-3657 Avellaneda, Santa Fe, Argentina
关键词
Process system engineering; Process development; Experimental design; Modeling for optimization; PROBABILISTIC TENDENCY MODELS; RESEARCH-AND-DEVELOPMENT; ONLINE OPTIMIZATION; DESIGN; PRODUCTIVITY; STRATEGIES;
D O I
10.1590/0104-6632.20180353s20170212
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Research and development of new processes is a fundamental part of any innovative industry. For process engineers, finding optimal operating conditions for new processes from the early stages is a main issue, since it improves economic viability, helps others areas of R&D by avoiding product bottlenecks and shortens the time-to-market period. Model-based optimization strategies are helpful in doing so, but imperfect models with parametric or structural errors can lead to suboptimal operating conditions. In this work, a methodology that uses probabilistic tendency models that are constantly updated through experimental feedback is proposed in order to rapidly and efficiently find improved operating conditions. Characterization of the uncertainty is used to make safe predictions even with scarce data, which is typical in this early stage of process development. The methodology is tested with an example from the traditional innovative pharmaceutical industry.
引用
收藏
页码:1063 / 1079
页数:17
相关论文
共 50 条
  • [21] An IEC 61499 based run-to-run controller for chemical mechanical planarization process
    Goh, K. M.
    Manaf, A.
    Tjahjono, B.
    Aendenroomer, A. J. R.
    2008 IEEE INTERNATIONAL CONFERENCE ON EMERGING TECHNOLOGIES AND FACTORY AUTOMATION, PROCEEDINGS, 2008, : 25 - +
  • [22] On Variable Weight EWMA Based Run-to-Run Control in Mixed Product Process
    Zheng Ying
    Hou Mingyang
    PROCEEDINGS OF THE 27TH CHINESE CONTROL CONFERENCE, VOL 7, 2008, : 6 - 10
  • [23] A batch-based run-to-run process control scheme for semiconductor manufacturing
    Wang, Kaibo
    Han, Kai
    IIE TRANSACTIONS, 2013, 45 (06) : 658 - 669
  • [24] Mixed product run-to-run process control - An ANOVA model with ARIMA disturbance approach
    Ma, Ming-Da
    Chang, Chun-Cheng
    Jang, Shi-Shang
    Wong, David Shan-Hill
    JOURNAL OF PROCESS CONTROL, 2009, 19 (04) : 604 - 614
  • [25] Application of a Run-to-Run Controller to a Vapor Phase Epitaxy Process
    De Luca, C.
    Maran, E.
    Baumgartl, J.
    Beghi, A.
    2009 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2009, : 211 - 216
  • [26] A new run-to-run control method for oxide CMP process
    Wang, J
    He, QP
    DATA ANALYSIS AND MODELING FOR PROCESS CONTROL II, 2005, 5755 : 9 - 17
  • [27] A RLS Run-to-Run Control Approach for Semiconductor Manufacturing Process
    Liu, Shujie
    Zheng, Ying
    Luo, Ming
    Wang, Yanwei
    PROCEEDINGS OF THE 10TH WORLD CONGRESS ON INTELLIGENT CONTROL AND AUTOMATION (WCICA 2012), 2012, : 2642 - 2646
  • [28] Adaptive Cautious Regularized Run-to-Run Controller for Lithography Process
    Zhong, Zhen
    Wang, Andi
    Kim, Hyunsik
    Paynabar, Kamran
    Shi, Jianjun
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2021, 34 (03) : 387 - 397
  • [29] A General Harmonic Rule Controller for Run-to-Run Process Control
    He, Fangyi
    Wang, Kaibo
    Jiang, Wei
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2009, 22 (02) : 232 - 244
  • [30] Run-to-run iterative optimization control of batch processes based on recurrent neural networks
    Xiong, ZH
    Zhang, J
    Wang, X
    Xu, Y
    ADVANCES IN NEURAL NETWORKS - ISNN 2004, PT 2, 2004, 3174 : 97 - 103