Ion current distribution within a toroidal duct of a filtered vacuum arc deposition system

被引：0
|
作者：
Zhitomirsky, VN [1 ]
Boxman, R [1 ]
Goldsmith, S [1 ]
机构：
[1] TEL AVIV UNIV,ELECT DISCHARGE & PLASMA LAB,IL-69978 TEL AVIV,ISRAEL
来源：
ISDEIV - XVIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, VOLS I AND II | 1996年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：927 / 931
页数：5
相关论文
共 50 条
  • [31] Ion current distribution produced by a vacuum arc carbon plasma source
    Zhitomirsky, VN
    Zarchin, O
    Wang, SG
    Boxman, RL
    Goldsmith, S
    ISDEIV: XIXTH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, VOLS 1 AND 2, PROCEEDINGS, 2000, 19 : 654 - 657
  • [32] MEASUREMENT OF ANGULAR-DISTRIBUTION OF ION CURRENT FROM A VACUUM ARC
    HEBERLEIN, JVR
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (02): : 137 - 137
  • [33] Preparation of thin films by filtered are deposition and ion assisted arc deposition
    Zhao, JP
    Wang, X
    Chen, ZY
    Yang, SQ
    Shi, TS
    Liu, XH
    Zou, SC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 127 : 817 - 820
  • [34] Metal ion implantation using a filtered cathodic vacuum arc
    Bilek, MMM
    Evans, P
    Mckenzie, DR
    McCulloch, DG
    Zreiqat, H
    Howlett, CR
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) : 4198 - 4204
  • [35] High current vacuum-arc ion source for ion implantation and coating deposition technologies
    Ryabchikov, Alexander I.
    Ryabchikov, Igor A.
    Stepanov, Igor B.
    Dektyarev, Sergey V.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2006, 77 (03):
  • [36] Deposition of (Ti, Al)N films by filtered cathodic vacuum arc
    Cheng, YH
    Tay, BK
    Lau, SP
    Shi, X
    Chua, HC
    THIN SOLID FILMS, 2000, 379 (1-2) : 76 - 82
  • [37] Fabrication of ITO thin films by filtered cathodic vacuum arc deposition
    Chen, BJ
    Sun, XW
    Tay, BK
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 106 (03): : 300 - 304
  • [38] Effect of plasma duct bias on the plasma characteristics of a filtered vacuum arc source
    Kim, JK
    Kim, DG
    Byon, E
    Lee, S
    Kim, KH
    Lee, GH
    THIN SOLID FILMS, 2003, 444 (1-2) : 23 - 28
  • [39] Formation of carbon nanowalls by pulsed filtered cathodic vacuum arc deposition
    Tuzemen, Ebru Senadim
    Kilic, Merhan
    Zeyrek, Birsen Kesik
    Kasapoglu, Ahmet Emre
    Gur, Emre
    Alaydin, Behcet Ozgur
    Esen, Mehmet
    Esen, Ramazan
    DIAMOND AND RELATED MATERIALS, 2019, 93 : 200 - 207
  • [40] Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
    Bilek, MMM
    Milne, WI
    THIN SOLID FILMS, 1996, 290 : 299 - 304
12345